Technique for 25 nm x-ray nanolithography

The image-forming limit of x-ray lithography is said to be ∼70 nm using existing devices and technologies. This article presents methods to extend the limit to 25 nm or even below. Preparatory to the study, a light source was designed to improve x-ray beam toward shorter wavelength. In addition, a s...

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Bibliographic Details

Published in:	Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Vol. 19; no. 6; pp. 2428 - 2433
Main Authors:	Toyota, Eijiro, Hori, Toshitada, Khan, Mumit, Cerrina, Franco
Format:	Conference Proceeding Journal Article
Language:	English
Published:	01-11-2001
Subjects:	Computer simulation Image quality Imaging techniques Light propagation Light sources Nanotechnology Pattern matching Photoresists
Online Access:	Get full text
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