Compressive-stress-induced formation of thin-film tetrahedral amorphous carbon

• Published in: Physical review letters Vol. 67; no. 6; pp. 773 - 776
• Main Authors: MCKENZIE, D. R, MULLER, D, PAILTHORPE, B. A
• Format: Journal Article
• Language: English
• Published: Ridge, NY American Physical Society 05-08-1991
• Subjects: Condensed matter: structure, mechanical and thermal properties; Exact sciences and technology; Physics; Solid surfaces and solid-solid interfaces; Surface and interface dynamics and vibrations; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Thin film structure and morphology; Non metal; Phase transformation; Compressive stress; Preparation; Molecular dynamics method; Theoretical study; Carbon; Amorphous state structure; Vacuum deposition; Thin film
• ISSN: 0031-9007; 1079-7114
• DOI: 10.1103/physrevlett.67.773

Thin tetrahedrally coordinated amorphous carbon (ta-C) films have been grown using a filtered vacuum arc. ta-C is a new allotrope of carbon whose existence was previously thought to be unlikely. A model is proposed which accounts for the formation and structure of these films on the basis of the compressive stress generated by the shallow implantation of carbon ions. An optimal range of beam energies between 15 and 70 eV, a high film stress, and a graphitic surface are predicted and confirmed by experimental evidence. Computer simulation of the growth confirms that high compressive stress is generated by impact energies in this range. (Author)