Alkoxysilane adsorption on metal oxide substrates

• Published in: Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vol. 7; no. 3; pp. 1724 - 1728
• Main Authors: Ramsier, R. D., Zhuang, G. R., Henriksen, P. N.
• Format: Journal Article
• Language: English
• Published: Legacy CDMS 01-05-1989
• Subjects: Inorganic And Physical Chemistry; ALUMINIUM; SUBSTRATES; INTERFACE PHENOMENA; ABSORPTION SPECTROSCOPY; COPPER; ADSORPTION; ALKOXY RADICALS; FILMS; SURFACE PROPERTIES; SILANES; CHEMICAL PROPERTIES; INFRARED SPECTRA; Al,Cu; SOLID−FLUID INTERFACES; SURFACE REACTIONS; EXPERIMENTAL DATA; LIQUIDS; ELECTRON TUNNELING SPECTROSCOPY
• DOI: 10.1116/1.576034
• EISSN: 1520-8559
• ISSN: 0734-2101

Reflection-absorption infrared and inelastic electron tunneling spectroscopies have been used to study adsorption of liquid phase mono-, di-, and trialkoxysilanes on evaporated Al and Cu substrates. Spectral evidence shows that substrate properties influence the chemical and physical nature of trialkoxysilane films and that silane functionality plays a role in molecular orientation. Results show that dialkoxysilane films contain structural gradients, with adsorption at the monomolecular level influenced by surface morphology, and with organofunctionality and dosing procedure affecting the formation of thicker films. Evidence is presented that monoalkoxysilanes react with alumina surfaces, and a broad, multipeaked band from 1600 to 1900/cm has been interpreted as characteristic of the silylated AlO(x)Pb interface.