Fundamentals of planar-type inductively coupled thermal plasmas on a substrate for large-area material processing
In this work, the fundamentals of planar-type Ar inductively coupled thermal plasmas (ICTPs) with oxygen molecular gas on a substrate have been studied. Previously, aiming at large-area material processing, we developed a planar-type ICTP torch with a rectangular quartz vessel instead of a conventio...
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| Published in: | Japanese Journal of Applied Physics Vol. 55; no. 7S2; pp. 7 - 07LB03 |
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| Main Authors: | , , , , , |
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The Japan Society of Applied Physics
01-07-2016
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| Abstract | In this work, the fundamentals of planar-type Ar inductively coupled thermal plasmas (ICTPs) with oxygen molecular gas on a substrate have been studied. Previously, aiming at large-area material processing, we developed a planar-type ICTP torch with a rectangular quartz vessel instead of a conventional cylindrical tube. For the adoption of such planar-type ICTP to material processing, it is necessary to sustain the ICTP with molecular gases on a substrate stably and uniformly. To determine the uniformity of the ICTP formed on the substrate, spectroscopic observation was carried out at 3 mm above the substrate. Results showed that the radiation intensities of specified O atomic lines were almost uniformly detected along the surface of the substrate. This means that excited O atoms, which are important radicals for thermal plasma oxidation, are present in the planar-type ICTP uniformly on the substrate. |
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| AbstractList | In this work, the fundamentals of planar-type Ar inductively coupled thermal plasmas (ICTPs) with oxygen molecular gas on a substrate have been studied. Previously, aiming at large-area material processing, we developed a planar-type ICTP torch with a rectangular quartz vessel instead of a conventional cylindrical tube. For the adoption of such planar-type ICTP to material processing, it is necessary to sustain the ICTP with molecular gases on a substrate stably and uniformly. To determine the uniformity of the ICTP formed on the substrate, spectroscopic observation was carried out at 3 mm above the substrate. Results showed that the radiation intensities of specified O atomic lines were almost uniformly detected along the surface of the substrate. This means that excited O atoms, which are important radicals for thermal plasma oxidation, are present in the planar-type ICTP uniformly on the substrate. |
| Author | Irie, Hiromitsu Tanaka, Yasunori Tial, Mai Kai Suan Maruyama, Yuji Uesugi, Yoshihiko Ishijima, Tatsuo |
| Author_xml | – sequence: 1 givenname: Mai Kai Suan surname: Tial fullname: Tial, Mai Kai Suan email: maikai@stu.kanazawa-ac.jp organization: Kanazawa University Faculty of Electrical and Computer Engineering, Kanazawa 920-1192, Japan – sequence: 2 givenname: Hiromitsu surname: Irie fullname: Irie, Hiromitsu organization: Kanazawa University Faculty of Electrical and Computer Engineering, Kanazawa 920-1192, Japan – sequence: 3 givenname: Yuji surname: Maruyama fullname: Maruyama, Yuji organization: Kanazawa University Faculty of Electrical and Computer Engineering, Kanazawa 920-1192, Japan – sequence: 4 givenname: Yasunori surname: Tanaka fullname: Tanaka, Yasunori email: tanaka@ec.t.kanazawa-u.ac.jp organization: Kanazawa University Research Center for Sustainable Energy and Technology, Kanazawa 920-1192, Japan – sequence: 5 givenname: Yoshihiko surname: Uesugi fullname: Uesugi, Yoshihiko organization: Kanazawa University Research Center for Sustainable Energy and Technology, Kanazawa 920-1192, Japan – sequence: 6 givenname: Tatsuo surname: Ishijima fullname: Ishijima, Tatsuo organization: Kanazawa University Research Center for Sustainable Energy and Technology, Kanazawa 920-1192, Japan |
| BookMark | eNp1kMFLwzAUxoNMcJtePecoQmvaJU17nMOpY6CgnkOavM6ONumSVth_b8p23enxHr_ve3zfDE2MNYDQfUJizjL-tNksP2PGYsK3z2RxhabJgvKIkoxN0JSQNIlokaY3aOb9PqwZo8kUHdaD0bIF08vGY1vhrpFGuqg_doBrowfV13_QHLGyQ9eAxv0vuFY2I-dbGSQGS-yH0vdO9oAr63Aj3Q4i6UDiNtxcPeLOKvC-NrtbdF2FX3B3nnP0s375Xr1F24_X99VyGylK8j7KdAllBgUpqMpVleRKaWBaK1YpUlIGeQUkZVKHKBwgzaks0jznJdWEU80Xc_Rw8g2vDwP4XrS1V9CEfGAHL5KC0JSRRZ4END6hylnvHVSic3Ur3VEkRIzdirFbwZg4dRsEjydBbTuxt4MzIYnY72U3QvwrPYOi09UF-ILzPzQujRI |
| CODEN | JJAPB6 |
| CitedBy_id | crossref_primary_10_1007_s11090_017_9803_0 crossref_primary_10_1007_s11090_020_10144_5 crossref_primary_10_1002_tee_23040 crossref_primary_10_1007_s11090_018_9881_7 crossref_primary_10_1080_23746149_2020_1867637 |
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| ContentType | Journal Article |
| Copyright | 2016 The Japan Society of Applied Physics |
| Copyright_xml | – notice: 2016 The Japan Society of Applied Physics |
| DBID | AAYXX CITATION 7U5 8FD H8D L7M |
| DOI | 10.7567/JJAP.55.07LB03 |
| DatabaseName | CrossRef Solid State and Superconductivity Abstracts Technology Research Database Aerospace Database Advanced Technologies Database with Aerospace |
| DatabaseTitle | CrossRef Aerospace Database Solid State and Superconductivity Abstracts Technology Research Database Advanced Technologies Database with Aerospace |
| DatabaseTitleList | CrossRef Aerospace Database |
| DeliveryMethod | fulltext_linktorsrc |
| Discipline | Engineering Physics |
| EISSN | 1347-4065 |
| EndPage | 07LB03 |
| ExternalDocumentID | 10_7567_JJAP_55_07LB03 PP15038 |
| GroupedDBID | AALHV ACGFS ACNCT ALMA_UNASSIGNED_HOLDINGS ATQHT CEBXE F5P IOP IZVLO KOT MC8 N5L QTG RNS SJN AAYXX CITATION 7U5 8FD H8D L7M |
| ID | FETCH-LOGICAL-c408t-6dbeb6e9094c8cf18ccde5ddc5fc0b45e8fe025ad0027ee284a92887b4d074d73 |
| ISSN | 0021-4922 |
| IngestDate | Fri Jun 28 09:12:46 EDT 2024 Thu Nov 21 23:18:39 EST 2024 Wed Aug 21 03:33:27 EDT 2024 Thu Jan 07 13:53:12 EST 2021 |
| IsPeerReviewed | true |
| IsScholarly | true |
| Issue | 7S2 |
| Language | English |
| LinkModel | OpenURL |
| MergedId | FETCHMERGED-LOGICAL-c408t-6dbeb6e9094c8cf18ccde5ddc5fc0b45e8fe025ad0027ee284a92887b4d074d73 |
| Notes | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
| PQID | 1904250381 |
| PQPubID | 23500 |
| ParticipantIDs | proquest_miscellaneous_1904250381 crossref_primary_10_7567_JJAP_55_07LB03 iop_journals_10_7567_JJAP_55_07LB03 |
| PublicationCentury | 2000 |
| PublicationDate | 2016-07-01 |
| PublicationDateYYYYMMDD | 2016-07-01 |
| PublicationDate_xml | – month: 07 year: 2016 text: 2016-07-01 day: 01 |
| PublicationDecade | 2010 |
| PublicationTitle | Japanese Journal of Applied Physics |
| PublicationTitleAlternate | Jpn. J. Appl. Phys |
| PublicationYear | 2016 |
| Publisher | The Japan Society of Applied Physics |
| Publisher_xml | – name: The Japan Society of Applied Physics |
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| SSID | ssj0026541 ssj0026590 ssj0026540 ssj0064762 |
| Score | 2.16465 |
| Snippet | In this work, the fundamentals of planar-type Ar inductively coupled thermal plasmas (ICTPs) with oxygen molecular gas on a substrate have been studied.... |
| SourceID | proquest crossref iop |
| SourceType | Aggregation Database Enrichment Source Publisher |
| StartPage | 7 |
| SubjectTerms | Materials processing Molecular gases Quartz Radicals Substrates Thermal plasmas Tubes Variability |
| Title | Fundamentals of planar-type inductively coupled thermal plasmas on a substrate for large-area material processing |
| URI | https://iopscience.iop.org/article/10.7567/JJAP.55.07LB03 https://search.proquest.com/docview/1904250381 |
| Volume | 55 |
| hasFullText | 1 |
| inHoldings | 1 |
| isFullTextHit | |
| isPrint | |
| link | http://sdu.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwtV1Lj9MwELbaRUhwQLCAKC8ZgcQhSklS53VcoKuqoFWlFglOkRs7UkqbhLY57L9nxnYeKxapHDg0apwocTyfZ8bjeRDyLvY9J_OksAEgAVqrUpu7mO7OZaAcZCLkypgzW4ZX36PPUzYdDJragl3bf6U0tAGtMXL2H6jdPhQa4D_QHI5AdTieRPdLDO3QGfuVl0a15QXf28rUCuvvWvG37bWVlnW1lcp7EnjzFu877LjaPODWAdiJSlurvBC36C1uc1AvLdBv1UdYlQ4waARfo96C6MWSltYteq7yNe1c61e5KjWATh7WF_gt6x5OTZGvWb4vd_lR12YxSQ_qa75TCu-PepN3doeC_9St_FAX5T7vWzPcoPV81fhT8XDY1dZp9S_9bEIRYAEc68DmsdQcfMJCWBTrAhQNi9eZgA2Uw6V3m-wI_QB3r-fzi8XY98dO-PWjM-mkZOu7uFi4mEJnSO54wNuQtS7nV-0aP_Axd0534vZO4vZKwMLA5LHXH6DTiWIXPtzswA11aZiX1R86g1KEVg_JA0NZeqGh94gMZHFO7vfyWp6Tu2YMH5NffTjSMqM9ONIeHKmBIzVwpAaOtCwopy0cKcCRdnCkDRxpB8cn5NvldPVpZpsqH3bKnOhoB2It14GMnZilUZq5UZoK6QuR-lnqrJkvo0yCYs4FWlCkBHWKxx6IxjUToP6KcPKUnBVlIZ8Rmk4ilnmhwycyYpHIYu6m6IbJ4ijjLucj8r4ZzKTSyVwSWATjsCc47InvJ3rYR-QtjHVi5vXhxLs2G17hVUCYuSOpRDYibxqKJcC7cUMOpmJZw1NjFJm4V__8pPe9IPe6OfOSnB33tXxFhgdRv1Yo_A1K07eW |
| link.rule.ids | 315,782,786,27933,27934 |
| linkProvider | Multiple Vendors |
| openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Fundamentals+of+planar-type+inductively+coupled+thermal+plasmas+on+a+substrate+for+large-area+material+processing&rft.jtitle=Japanese+Journal+of+Applied+Physics&rft.au=Tial%2C+Mai+Kai+Suan&rft.au=Irie%2C+Hiromitsu&rft.au=Maruyama%2C+Yuji&rft.au=Tanaka%2C+Yasunori&rft.date=2016-07-01&rft.pub=The+Japan+Society+of+Applied+Physics&rft.issn=0021-4922&rft.eissn=1347-4065&rft.volume=55&rft.issue=7S2&rft_id=info:doi/10.7567%2FJJAP.55.07LB03&rft.externalDocID=PP15038 |
| thumbnail_l | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0021-4922&client=summon |
| thumbnail_m | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0021-4922&client=summon |
| thumbnail_s | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0021-4922&client=summon |