Hillock sizes after wet etching in silicon
The formation of two- and three-dimensional hillocks is regularly observed in Si(1 1 1) steps and Si(1 0 0) during wet etching. Frequently the resulting morphology consists of hillocks scattered on a landscape of limited roughness. Recently we proposed a mean field model (MFM) in which the observed...
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| Published in: | Surface science Vol. 603; no. 23; pp. 3346 - 3349 |
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| Abstract | The formation of two- and three-dimensional hillocks is regularly observed in Si(1
1
1) steps and Si(1
0
0) during wet etching. Frequently the resulting morphology consists of hillocks scattered on a landscape of limited roughness. Recently we proposed a mean field model (MFM) in which the observed hillock-and-valley pattern is possible under steady state if hillock etching is slightly faster than valley etching. This condition implies that hillock size distributions must be an exponential decreasing function. In this work, we report a systematic study of hillock size distributions of experimental morphologies obtained under different etchant concentrations in Si(1
0
0). We found that experimental hillock size distributions are in agreement with those predicted by the MFM. |
|---|---|
| AbstractList | The formation of two- and three-dimensional hillocks is regularly observed in Si(1 1 1) steps and Si(1 0 0) during wet etching. Frequently the resulting morphology consists of hillocks scattered on a landscape of limited roughness. Recently we proposed a mean field model (MFM) in which the observed hillock-and-valley pattern is possible under steady state if hillock etching is slightly faster than valley etching. This condition implies that hillock size distributions must be an exponential decreasing function. In this work, we report a systematic study of hillock size distributions of experimental morphologies obtained under different etchant concentrations in Si(1 0 0). We found that experimental hillock size distributions are in agreement with those predicted by the MFM. The formation of two- and three-dimensional hillocks is regularly observed in Si(1 1 1) steps and Si(1 0 0) during wet etching. Frequently the resulting morphology consists of hillocks scattered on a landscape of limited roughness. Recently we proposed a mean field model (MFM) in which the observed hillock-and-valley pattern is possible under steady state if hillock etching is slightly faster than valley etching. This condition implies that hillock size distributions must be an exponential decreasing function. In this work, we report a systematic study of hillock size distributions of experimental morphologies obtained under different etchant concentrations in Si(1 0 0). We found that experimental hillock size distributions are in agreement with those predicted by the MFM. |
| Author | Suárez, M.P. Mirabella, D.A. Aldao, C.M. |
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| Keywords | Etching Monte Carlo simulations Roughness and topography Morphology Surface structure Two-dimensional systems Digital simulation Three-dimensional systems Roughness Step Surface topography Steady state Magnetic force microscopy Mean-field theory Monte Carlo methods Silicon |
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| References | van Veenendaal, Sato, Shikida, van Suchtelen (bib4) 2001; 93 Tan, Reed, Han, Boudreau (bib5) 1996; 5 Newton, Huang, Lepak, Hines (bib15) 1999; 111 Baum, Schiffrin (bib3) 1997; 7 Campbell, Cooper, Dixon, Earwaker, Port, Schiffrin (bib13) 1995; 5 Flidr, Huang, Hines (bib10) 1999; 111 Elwenspoek, Jansen (bib1) 1998 Mirabella, Suárez, Aldao (bib19) 2008; 602 Landsberger, Naseh, Kahrizi, Paranjape (bib2) 1996; 5 Cheng, Gosálvez, Hori, Sato, Shikida (bib7) 2006; 125 Wind, Hines (bib9) 2000; 460 Nijdam, van Veenendaal, Cuppen, van Suchtelen, Reed, Gardeniers, van Enckevort, Vlieg, Elwenspoek (bib12) 2001; 89 Schröder, Obermeier, Steckenborn (bib6) 1999; 9 Gosálvez, Sato, Foster, Nieminen, Tanaka (bib11) 2007; 17 Flidr, Huang, Newton, Hines (bib14) 1998; 108 Suárez, Mirabella, Aldao (bib17) 2005; 599 Suárez, Mirabella, Aldao (bib18) 2008; 281 Lee (bib8) 1969; 40 Gosálvez, Nieminen (bib16) 2003; 5 Raisch, Raisch, Nichols, Schiffrin (bib20) 2000; 45 van Veenendaal (10.1016/j.susc.2009.09.022_bib4) 2001; 93 Schröder (10.1016/j.susc.2009.09.022_bib6) 1999; 9 Baum (10.1016/j.susc.2009.09.022_bib3) 1997; 7 Newton (10.1016/j.susc.2009.09.022_bib15) 1999; 111 Suárez (10.1016/j.susc.2009.09.022_bib18) 2008; 281 Cheng (10.1016/j.susc.2009.09.022_bib7) 2006; 125 Tan (10.1016/j.susc.2009.09.022_bib5) 1996; 5 Gosálvez (10.1016/j.susc.2009.09.022_bib11) 2007; 17 Flidr (10.1016/j.susc.2009.09.022_bib14) 1998; 108 Lee (10.1016/j.susc.2009.09.022_bib8) 1969; 40 Mirabella (10.1016/j.susc.2009.09.022_bib19) 2008; 602 Wind (10.1016/j.susc.2009.09.022_bib9) 2000; 460 Flidr (10.1016/j.susc.2009.09.022_bib10) 1999; 111 Nijdam (10.1016/j.susc.2009.09.022_bib12) 2001; 89 Gosálvez (10.1016/j.susc.2009.09.022_bib16) 2003; 5 Elwenspoek (10.1016/j.susc.2009.09.022_bib1) 1998 Raisch (10.1016/j.susc.2009.09.022_bib20) 2000; 45 Campbell (10.1016/j.susc.2009.09.022_bib13) 1995; 5 Suárez (10.1016/j.susc.2009.09.022_bib17) 2005; 599 Landsberger (10.1016/j.susc.2009.09.022_bib2) 1996; 5 |
| References_xml | – volume: 9 start-page: 139 year: 1999 ident: bib6 publication-title: J. Micromech. Microeng. contributor: fullname: Steckenborn – volume: 460 start-page: 21 year: 2000 ident: bib9 publication-title: Surf. Sci. contributor: fullname: Hines – volume: 602 start-page: 1572 year: 2008 ident: bib19 publication-title: Surf. Sci. contributor: fullname: Aldao – volume: 45 start-page: 4635 year: 2000 ident: bib20 publication-title: Electrochimica Acta contributor: fullname: Schiffrin – volume: 125 start-page: 415 year: 2006 ident: bib7 publication-title: Sensor. Actuat. A contributor: fullname: Shikida – volume: 5 start-page: 106 year: 1996 ident: bib2 publication-title: J. Microelectromech. Syst. contributor: fullname: Paranjape – volume: 599 start-page: 221 year: 2005 ident: bib17 publication-title: Surf. Sci. contributor: fullname: Aldao – volume: 5 start-page: 1057 year: 1996 ident: bib5 publication-title: J. Microelectromech. Syst. contributor: fullname: Boudreau – volume: 5 start-page: 209 year: 1995 ident: bib13 publication-title: J. Micromech. Microeng. contributor: fullname: Schiffrin – volume: 111 start-page: 6970 year: 1999 ident: bib10 publication-title: J. Chem. Phys. contributor: fullname: Hines – volume: 17 start-page: S1 year: 2007 ident: bib11 publication-title: J. Micromech. Microeng. contributor: fullname: Tanaka – year: 1998 ident: bib1 article-title: Silicon Micromachining contributor: fullname: Jansen – volume: 40 start-page: 4569 year: 1969 ident: bib8 publication-title: J. Appl. Phys. contributor: fullname: Lee – volume: 111 start-page: 9125 year: 1999 ident: bib15 publication-title: J. Chem. Phys. contributor: fullname: Hines – volume: 108 start-page: 5542 year: 1998 ident: bib14 publication-title: J. Chem. Phys. contributor: fullname: Hines – volume: 93 start-page: 219 year: 2001 ident: bib4 publication-title: Sensor. Actuat. A contributor: fullname: van Suchtelen – volume: 281 start-page: 230 year: 2008 ident: bib18 publication-title: J. Mol. Cat. A contributor: fullname: Aldao – volume: 89 start-page: 4113 year: 2001 ident: bib12 publication-title: J. Appl. Phys. contributor: fullname: Elwenspoek – volume: 5 start-page: 100 year: 2003 ident: bib16 publication-title: New J. Phys. contributor: fullname: Nieminen – volume: 7 start-page: 338 year: 1997 ident: bib3 publication-title: J. Micromech. Microeng. contributor: fullname: Schiffrin – volume: 281 start-page: 230 year: 2008 ident: 10.1016/j.susc.2009.09.022_bib18 publication-title: J. Mol. Cat. A doi: 10.1016/j.molcata.2007.08.012 contributor: fullname: Suárez – volume: 460 start-page: 21 year: 2000 ident: 10.1016/j.susc.2009.09.022_bib9 publication-title: Surf. Sci. doi: 10.1016/S0039-6028(00)00479-9 contributor: fullname: Wind – volume: 602 start-page: 1572 year: 2008 ident: 10.1016/j.susc.2009.09.022_bib19 publication-title: Surf. Sci. doi: 10.1016/j.susc.2008.02.013 contributor: fullname: Mirabella – volume: 111 start-page: 9125 year: 1999 ident: 10.1016/j.susc.2009.09.022_bib15 publication-title: J. Chem. Phys. doi: 10.1063/1.479386 contributor: fullname: Newton – volume: 111 start-page: 6970 year: 1999 ident: 10.1016/j.susc.2009.09.022_bib10 publication-title: J. Chem. Phys. doi: 10.1063/1.479990 contributor: fullname: Flidr – volume: 9 start-page: 139 year: 1999 ident: 10.1016/j.susc.2009.09.022_bib6 publication-title: J. Micromech. Microeng. doi: 10.1088/0960-1317/9/2/309 contributor: fullname: Schröder – volume: 125 start-page: 415 year: 2006 ident: 10.1016/j.susc.2009.09.022_bib7 publication-title: Sensor. Actuat. A doi: 10.1016/j.sna.2005.08.022 contributor: fullname: Cheng – volume: 17 start-page: S1 year: 2007 ident: 10.1016/j.susc.2009.09.022_bib11 publication-title: J. Micromech. Microeng. doi: 10.1088/0960-1317/17/4/S01 contributor: fullname: Gosálvez – volume: 7 start-page: 338 year: 1997 ident: 10.1016/j.susc.2009.09.022_bib3 publication-title: J. Micromech. Microeng. doi: 10.1088/0960-1317/7/4/010 contributor: fullname: Baum – volume: 45 start-page: 4635 year: 2000 ident: 10.1016/j.susc.2009.09.022_bib20 publication-title: Electrochimica Acta doi: 10.1016/S0013-4686(00)00615-0 contributor: fullname: Raisch – year: 1998 ident: 10.1016/j.susc.2009.09.022_bib1 contributor: fullname: Elwenspoek – volume: 93 start-page: 219 year: 2001 ident: 10.1016/j.susc.2009.09.022_bib4 publication-title: Sensor. Actuat. A doi: 10.1016/S0924-4247(01)00655-0 contributor: fullname: van Veenendaal – volume: 89 start-page: 4113 year: 2001 ident: 10.1016/j.susc.2009.09.022_bib12 publication-title: J. Appl. Phys. doi: 10.1063/1.1352557 contributor: fullname: Nijdam – volume: 5 start-page: 209 year: 1995 ident: 10.1016/j.susc.2009.09.022_bib13 publication-title: J. Micromech. Microeng. doi: 10.1088/0960-1317/5/3/002 contributor: fullname: Campbell – volume: 108 start-page: 5542 year: 1998 ident: 10.1016/j.susc.2009.09.022_bib14 publication-title: J. Chem. Phys. doi: 10.1063/1.475944 contributor: fullname: Flidr – volume: 5 start-page: 1057 year: 1996 ident: 10.1016/j.susc.2009.09.022_bib5 publication-title: J. Microelectromech. Syst. contributor: fullname: Tan – volume: 5 start-page: 106 year: 1996 ident: 10.1016/j.susc.2009.09.022_bib2 publication-title: J. Microelectromech. Syst. doi: 10.1109/84.506198 contributor: fullname: Landsberger – volume: 599 start-page: 221 year: 2005 ident: 10.1016/j.susc.2009.09.022_bib17 publication-title: Surf. Sci. doi: 10.1016/j.susc.2005.10.011 contributor: fullname: Suárez – volume: 40 start-page: 4569 year: 1969 ident: 10.1016/j.susc.2009.09.022_bib8 publication-title: J. Appl. Phys. doi: 10.1063/1.1657233 contributor: fullname: Lee – volume: 5 start-page: 100 year: 2003 ident: 10.1016/j.susc.2009.09.022_bib16 publication-title: New J. Phys. doi: 10.1088/1367-2630/5/1/400 contributor: fullname: Gosálvez |
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| Snippet | The formation of two- and three-dimensional hillocks is regularly observed in Si(1
1
1) steps and Si(1
0
0) during wet etching. Frequently the resulting... The formation of two- and three-dimensional hillocks is regularly observed in Si(1 1 1) steps and Si(1 0 0) during wet etching. Frequently the resulting... |
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| SubjectTerms | Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science; rheology Etching Exact sciences and technology Landscapes Mathematical models Monte Carlo simulations Morphology Physics Roughness and topography Silicon Size distribution Steady state Surface structure Valleys |
| Title | Hillock sizes after wet etching in silicon |
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