The structure and toughness of TiN coatings prepared by modulated pulsed power magnetron sputtering
Titanium nitride (TiN) coatings were prepared on different substrates (Si wafer, M2 steel, glass) by modulated pulsed power (MPP) sputtering and continuous dc magnetron sputtering (dcMS). The structure and properties were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM...
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Published in: | Vacuum Vol. 125; pp. 165 - 169 |
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Main Authors: | , , , , |
Format: | Journal Article |
Language: | English |
Published: |
Elsevier Ltd
01-03-2016
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Subjects: | |
Online Access: | Get full text |
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