XPS and HRTEM characterization of cobalt–nickel silicide thin films

We studied by X-ray photoelectron spectroscopy (XPS) and high-resolution transmission electron microscopy (HRTEM) films of Co–Ni/p-Si deposited by PLD on Si(100) substrates. They were thermally treated in vacuum to promote silicide formation. By means of XPS in-depth profiles, it was observed that t...

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Bibliographic Details
Published in:	Applied surface science Vol. 161; no. 1; pp. 61 - 73
Main Authors:	Garcı́a-Méndez, M, Castillón, F.F, Hirata, G.A, Farı́as, M.H, Beamson, G
Format:	Journal Article
Language:	English
Published:	Amsterdam Elsevier B.V 01-07-2000 Elsevier Science
Subjects:	Adsorbed layers and thin films Co silicides Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science; rheology Electron and ion emission by liquids and solids; impact phenomena Exact sciences and technology Laser deposition Materials science Methods of deposition of films and coatings; film growth and epitaxy Ni silicides Photoemission and photoelectron spectra Physics Structure and morphology; thickness Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology X-ray photoelectron spectroscopy EE Ni silicides Co silicides TI PG 81.15.Fg 82.80.Pv CP X-ray photoelectron spectroscopy 72.80.Ga Thin films Annealing Cobalt silicides Transition element compounds Nickel silicides Laser ablation technique Experimental study TEM X-ray photoelectron spectra
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