Investigation of low temperature thermal stability in bulk nanocrystalline Ni

Grain growth behavior of bulk nanocrystalline Ni, prepared by an electrodeposition technique with average grain sizes of 20 and 15 nm was investigated in the homologous temperature ( T/ T m) range of 0.20–0.40. In studying grain growth, the techniques of X-ray diffraction and transmission electron m...

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Bibliographic Details
Published in:	Materials science & engineering. A, Structural materials : properties, microstructure and processing Vol. 427; no. 1; pp. 7 - 15
Main Authors:	Chauhan, Manish, Mohamed, Farghalli A.
Format:	Journal Article
Language:	English
Published:	Amsterdam Elsevier B.V 15-07-2006 Elsevier
Subjects:	Cross-disciplinary physics: materials science; rheology Electrodeposition Exact sciences and technology Grain growth Impurity segregation Materials science Nanocrystalline materials Nanocrystalline Ni Nanoscale materials and structures: fabrication and characterization Physics TEM XRD Electrodeposition XRD Grain growth Nanocrystalline Ni TEM Impurity segregation Grain size Annealing Growth rate Grain boundary migration Thermal stability Transmission electron microscopy Ordering Nickel Activation energy Nanocrystal
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