Thermal stability of plasma deposited polysilanes

A new method for studying thermal stability and concomitant chemical composition changes on thermal treatment of thin polymeric films is presented. It is applied to the study of thermal properties and modification of properties of polysilane-like materials with variable dimensionality prepared by ra...

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Bibliographic Details
Published in:	Polymer degradation and stability Vol. 91; no. 12; pp. 2901 - 2910
Main Authors:	Kuřitka, Ivo, Horváth, Pavel, Schauer, František, Zemek, Josef
Format:	Journal Article
Language:	English
Published:	Oxford Elsevier Ltd 01-12-2006 Elsevier Science
Subjects:	Applied sciences Exact sciences and technology Inorganic and organomineral polymers Luminescence Physicochemistry of polymers Plasma Polysilane Properties and characterization Thermal degradation Thermal desorption spectroscopy, TDS Thin film Plasma Polysilane Thermal desorption spectroscopy, TDS Luminescence Thin film Thermal degradation Annealing TDS Heat treatment Temperature effect Experimental study TDS; Polysilane; Luminescence; Thin film; Plasma; Thermal degradation Thermal stability Thermal properties Spectrum analysis Thermal desorption spectroscopy Reaction mechanism Plasma deposition
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