Why the close‐packed Ni(111) surface dissociatively chemisorbs oxygen and nucleates oxide faster than the more open Ni(100) surface

The 300 K kinetics of dissociative chemisorption and oxide island nucleation and growth are compared for Ni(100) and Ni(111). We conclude that the behavior of oxygen sticking probability as a function of coverage can be understood in terms of direct Langmuir adsorption (no molecular diffusion) and t...

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Bibliographic Details
Published in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vol. 3; no. 3; pp. 1468 - 1471
Main Author: Brundle, C. R.
Format: Journal Article
Language:English
Published: 01-05-1985
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Summary:The 300 K kinetics of dissociative chemisorption and oxide island nucleation and growth are compared for Ni(100) and Ni(111). We conclude that the behavior of oxygen sticking probability as a function of coverage can be understood in terms of direct Langmuir adsorption (no molecular diffusion) and the availability of active empty clusters of adsorption sites of certain sizes and configurations.
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ISSN:0734-2101
1520-8559
DOI:10.1116/1.572763