System-level Pareto frontiers for on-chip thermoelectric coolers
The continuous rise in heat dissipation of integrated circuits necessitates advanced thermal solutions to ensure system reliability and efficiency. Thermoelectric coolers are among the most promising techniques for dealing with localized on-chip hot spots. This study focuses on establishing a holist...
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Published in: | Frontiers in Energy Vol. 12; no. 1; pp. 109 - 120 |
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Main Authors: | , , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
Beijing
Higher Education Press
01-03-2018
Springer Nature B.V |
Subjects: | |
Online Access: | Get full text |
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Summary: | The continuous rise in heat dissipation of integrated circuits necessitates advanced thermal solutions to ensure system reliability and efficiency. Thermoelectric coolers are among the most promising techniques for dealing with localized on-chip hot spots. This study focuses on establishing a holistic optimization methodol- ogy for such thermoelectric coolers, in which a thermo- electric element's thickness and the electrical current are optimized to minimize source temperature with respect to ambient, when the thermal and electrical parasitic effects are considered. It is found that when element thickness and electrical current are optimized for a given system architecture, a "heat flux vs. temperature difference" Pareto frontier curve is obtained, indicating that there is an optimum thickness and a corresponding optimum current that maximize the achievable temperature reduc- tion while removing a particular heat flux. This methodol- ogy also provides the possible system level AT's that can be achieved for a range of heat fluxes, defining the upper limits of thermoelectric cooling for that architecture. In this study, use was made of an extensive analytical model, which was verified using commercially available finite element analysis software. Through the optimization process, 3 pairs of master curves were generated, which were then used to compose the Pareto frontier for any given system architecture. Finally, a case study wasperformed to provide an in-depth demonstration of the optimization procedure for an example application. |
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Bibliography: | thermoelectric cooling, thermal management,optimization, high flux electronics The continuous rise in heat dissipation of integrated circuits necessitates advanced thermal solutions to ensure system reliability and efficiency. Thermoelectric coolers are among the most promising techniques for dealing with localized on-chip hot spots. This study focuses on establishing a holistic optimization methodol- ogy for such thermoelectric coolers, in which a thermo- electric element's thickness and the electrical current are optimized to minimize source temperature with respect to ambient, when the thermal and electrical parasitic effects are considered. It is found that when element thickness and electrical current are optimized for a given system architecture, a "heat flux vs. temperature difference" Pareto frontier curve is obtained, indicating that there is an optimum thickness and a corresponding optimum current that maximize the achievable temperature reduc- tion while removing a particular heat flux. This methodol- ogy also provides the possible system level AT's that can be achieved for a range of heat fluxes, defining the upper limits of thermoelectric cooling for that architecture. In this study, use was made of an extensive analytical model, which was verified using commercially available finite element analysis software. Through the optimization process, 3 pairs of master curves were generated, which were then used to compose the Pareto frontier for any given system architecture. Finally, a case study wasperformed to provide an in-depth demonstration of the optimization procedure for an example application. 11-6017/TK Document received on :2017-07-23 optimization thermal management high flux electronics thermoelectric cooling Document accepted on :2017-10-11 |
ISSN: | 2095-1701 2095-1698 |
DOI: | 10.1007/s11708-018-0540-8 |