Determination of pore size distribution in thin films by ellipsometric porosimetry
We show that ellipsometric porosimetry can be used for the measurement of the pore size distribution in thin porous films deposited on top of any smooth solid substrate. In this method, in situ ellipsometry is used to determine the amount of adsorptive, which is adsorbed/condensed in the film. Chang...
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| Published in: | Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Vol. 18; no. 3; pp. 1385 - 1391 |
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| Main Authors: | , , , |
| Format: | Journal Article |
| Language: | English |
| Published: |
01-05-2000
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| Abstract | We show that ellipsometric porosimetry can be used for the measurement of the pore size distribution in thin porous films deposited on top of any smooth solid substrate. In this method, in situ ellipsometry is used to determine the amount of adsorptive, which is adsorbed/condensed in the film. Changes in refractive index and film thickness are used to calculate the quantity of adsorptive present in the film. Room temperature porosimetry based on adsorption of vapor of organic solvents has been developed. In this article, a method of calculation of pore size distribution and results of measurements on mesoporous and microporous xerogel films is discussed. Examination of the validity of the Gurvitsch rule for various organic adsorptives (toluene, heptane, and carbon tetrachloride) is carried out to assess the reliability of measurements of pore size distributions by ellipsometric porosimetry. |
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| AbstractList | A new modification of adsorption porosimetry, ellipsometric porosimetry, has been developed for thin film application. It is a reliable and simple method for nondestructive characterization of mesoporous dielectric films. This method allows the measurement of pore size distribution at room temperature in thin films directly deposited on Si or any smooth solid substrate. We show that ellipsometric porosimetry can be used for the measurement of the pore size distribution in thin porous films deposited on top of any smooth solid substrate. In this method, in situ ellipsometry is used to determine the amount of adsorptive, which is adsorbed/condensed in the film. Changes in refractive index and film thickness are used to calculate the quantity of adsorptive present in the film. Room temperature porosimetry based on adsorption of vapor of organic solvents has been developed. In this article, a method of calculation of pore size distribution and results of measurements on mesoporous and microporous xerogel films is discussed. Examination of the validity of the Gurvitsch rule for various organic adsorptives (toluene, heptane, and carbon tetrachloride) is carried out to assess the reliability of measurements of pore size distributions by ellipsometric porosimetry. |
| Author | Dultsev, F. N. Mogilnikov, K. P. Baklanov, M. R. Polovinkin, V. G. |
| Author_xml | – sequence: 1 givenname: M. R. surname: Baklanov fullname: Baklanov, M. R. organization: IMEC, B-3001 Leuven, Belgium – sequence: 2 givenname: K. P. surname: Mogilnikov fullname: Mogilnikov, K. P. organization: Institute of Semiconductor Physics SB RAS, 630090 Novosibirsk, Russia – sequence: 3 givenname: V. G. surname: Polovinkin fullname: Polovinkin, V. G. organization: Institute of Semiconductor Physics SB RAS, 630090 Novosibirsk, Russia – sequence: 4 givenname: F. N. surname: Dultsev fullname: Dultsev, F. N. organization: Institute of Semiconductor Physics SB RAS, 630090 Novosibirsk, Russia |
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| CODEN | JVTBD9 |
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| References | Amberg, McIntosh (r11) 1952; 30 Muranova, Perveev (r9) 1993; 60 Gurvitsch (r13) 1915; 47 Baklanov, Dultsev, Repinsky (r3) 1988; 11 Ramsay (r6) 1999; 24 Dultsev, Baklanov (r8) 1999; 2 Baklanov, Vasilyeva, Gavrilova, Dultsev, Mogilnikov, Nenasheva (r4) 1989; 171 Sing, Everett, Haul, Moscou, Pierotti, Rouquerol, Siemieniewska (r10) 1985; 57 Yates (r12) 1954; 224 |
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| Snippet | We show that ellipsometric porosimetry can be used for the measurement of the pore size distribution in thin porous films deposited on top of any smooth solid... A new modification of adsorption porosimetry, ellipsometric porosimetry, has been developed for thin film application. It is a reliable and simple method for... |
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| SubjectTerms | Ellipsometry Pore size Porosimeters Refractive index Substrates Thin films |
| Title | Determination of pore size distribution in thin films by ellipsometric porosimetry |
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