The Influence of High-Frequency Discharge on Substrate Temperature during Film Deposition

The process of discharge-induced substrate heating at the initial stage of film synthesis by method of high-frequency cathode sputter deposition has been studied. The temperature to which the substrate was heated after the discharge switch-on was determined using the optical interferometry technique...

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Published in:	Technical physics letters Vol. 45; no. 5; pp. 478 - 480
Main Authors:	Shirokov, V. B., Zinchenko, S. P.
Format:	Journal Article
Language:	English
Published:	Moscow Pleiades Publishing 01-05-2019 Springer Nature B.V
Subjects:	BARIUM COMPOUNDS Barium strontium titanates Cathode sputtering CATHODES Classical and Continuum Physics CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY DEPOSITION Discharge HEATING HIGH-FREQUENCY DISCHARGES INTERFEROMETRY Magnesium oxide MAGNESIUM OXIDES Physics Physics and Astronomy SPUTTERING STRONTIUM TITANATES SUBSTRATES Superconductors (materials) SYNTHESIS THIN FILMS
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Abstract	The process of discharge-induced substrate heating at the initial stage of film synthesis by method of high-frequency cathode sputter deposition has been studied. The temperature to which the substrate was heated after the discharge switch-on was determined using the optical interferometry technique. In a working regime of barium strontium titanate film deposition onto a magnesium oxide substrate, the substrate temperature exceeded 1000°C.
AbstractList	The process of discharge-induced substrate heating at the initial stage of film synthesis by method of high-frequency cathode sputter deposition has been studied. The temperature to which the substrate was heated after the discharge switch-on was determined using the optical interferometry technique. In a working regime of barium strontium titanate film deposition onto a magnesium oxide substrate, the substrate temperature exceeded 1000°C.
Author	Shirokov, V. B. Zinchenko, S. P.
Author_xml	– sequence: 1 givenname: V. B. surname: Shirokov fullname: Shirokov, V. B. email: shirokov-vb@rambler.ru organization: Southern Research Center, Russian Academy of Sciences, Southern Federal University – sequence: 2 givenname: S. P. surname: Zinchenko fullname: Zinchenko, S. P. organization: Southern Research Center, Russian Academy of Sciences, Southern Federal University
BackLink	https://www.osti.gov/biblio/22929262$$D View this record in Osti.gov
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References	MukhortovV. M.GolovkoYu. I.BiryukovS. V.AnokhinA.YuzyukYu. I.Tech. Phys.2016619110.1134/S106378421601014X BornM.WolfE.Principles of Optics2002CambridgeCambridge Univ. Press LyuJ.FinaI.SolanasR.FontcubertaJ.SänchezF.Sci. Rep.201884952018NatSR...8..495L10.1038/s41598-017-18842-5 V. M. Mukhortov and Yu. I. Yuzyuk, Heterostructures Based on Nanoscale Ferroelectric Films: Production, Properties and Applications (YuNTs RAN, Rostov-on-Don, 2008) [in Russian]. TsayY. F.BendowB.MitraS. S.Phys. Rev. B1973826881973PhRvB...8.2688T10.1103/PhysRevB.8.2688 FiquetG.RichetP.MontagnacG.Phys. Chem. Miner.1999271031999PCM....27..103F10.1007/s002690050246 SchlomD. G.ChenL.-Q.FennieC. J.GopalanV.MullerD. A.PanX.RameshR.UeckerR.MRS Bull.20143911810.1557/mrs.2014.1 ZinchenkoS. P.KovtunA. P.TolmachevG. N.Nanotechnol. Russ.2010532810.1134/S1995078010050071 ShirokovV. B.YuzyukYu. I.DkhilB.LemanovV. V.Phys. Solid State2008509282008PhSS...50..928S10.1134/S106378340805020X S. P. Zinchenko (3134_CR6) 2010; 5 Y. F. Tsay (3134_CR7) 1973; 8 G. Fiquet (3134_CR8) 1999; 27 J. Lyu (3134_CR4) 2018; 8 V. M. Mukhortov (3134_CR1) 2016; 61 D. G. Schlom (3134_CR2) 2014; 39 3134_CR5 V. B. Shirokov (3134_CR3) 2008; 50 M. Born (3134_CR9) 2002
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SubjectTerms	BARIUM COMPOUNDS Barium strontium titanates Cathode sputtering CATHODES Classical and Continuum Physics CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY DEPOSITION Discharge HEATING HIGH-FREQUENCY DISCHARGES INTERFEROMETRY Magnesium oxide MAGNESIUM OXIDES Physics Physics and Astronomy SPUTTERING STRONTIUM TITANATES SUBSTRATES Superconductors (materials) SYNTHESIS THIN FILMS
Title	The Influence of High-Frequency Discharge on Substrate Temperature during Film Deposition
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