The Influence of High-Frequency Discharge on Substrate Temperature during Film Deposition

The Influence of High-Frequency Discharge on Substrate Temperature during Film Deposition

The process of discharge-induced substrate heating at the initial stage of film synthesis by method of high-frequency cathode sputter deposition has been studied. The temperature to which the substrate was heated after the discharge switch-on was determined using the optical interferometry technique...

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Bibliographic Details
Published in:Technical physics letters Vol. 45; no. 5; pp. 478 - 480
Main Authors: Shirokov, V. B., Zinchenko, S. P.
Format: Journal Article
Language:English
Published: Moscow Pleiades Publishing 01-05-2019
Springer Nature B.V
Subjects:
BARIUM COMPOUNDS
Barium strontium titanates
Cathode sputtering
CATHODES
Classical and Continuum Physics
CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
DEPOSITION
Discharge
HEATING
HIGH-FREQUENCY DISCHARGES
INTERFEROMETRY
Magnesium oxide
MAGNESIUM OXIDES
Physics
Physics and Astronomy
SPUTTERING
STRONTIUM TITANATES
SUBSTRATES
Superconductors (materials)
SYNTHESIS
THIN FILMS
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Summary:The process of discharge-induced substrate heating at the initial stage of film synthesis by method of high-frequency cathode sputter deposition has been studied. The temperature to which the substrate was heated after the discharge switch-on was determined using the optical interferometry technique. In a working regime of barium strontium titanate film deposition onto a magnesium oxide substrate, the substrate temperature exceeded 1000°C.
ISSN:1063-7850
1090-6533
DOI:10.1134/S1063785019050316