Interfacial structure of ferromagnetic Fe-Pt thin films grown on a Si substrate

• Published in: Current applied physics Vol. 11; no. 4; pp. S95 - S97
• Main Authors: Jang, Pyungwoo, Jung, Chi-Sup, Seomoon, Kyu, Kim, Kwang-Ho
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 01-07-2011
• Subjects: energy; FePt; phase transition; Pt 2Si; silica; silicon; X-ray diffraction; X-ray photoelectron spectroscopy; XPS; Pt 2Si; FePt; XPS
• ISSN: 1567-1739; 1878-1675
• DOI: 10.1016/j.cap.2011.07.015

In order to understand the Fe-Pt phase transformation, Fe-Pt films were sputtered on HF-treated, untreated Si substrates, and SiO
2 substrates and the magnetic and structural properties were analyzed by XRD, VSM, and XPS. The formation of Pt
2Si on the interface between Fe-Pt films and a Si substrate could be clearly observed with a shift of Pt4f
7/2 binding energy. Native oxide on the surface of Si substrate slowed the transformation of the disordered Fe-Pt phase to the ordered phase. The Pt
2Si phase was easily formed during sputtering on an HF treated Si substrate; moreover, a formation of a very small amount of Pt
2Si phase could be observed on the interface of Fe-Pt films and a SiO
2 substrate. Thus, the formation of Pt silicide assumes an important role in the transformation of Fe-Pt films grown on Si substrates.