Accurate current sensor for lateral IGBT smart power integration

This paper describes research work on the design and fabrication of a current sensor suitable for smart power integration in lateral insulated-gate bipolar transistor (LIGBT) structure. In general, the proposed design can also be used for various types of MOS-controlled bipolar transistor structures...

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Published in:IEEE transactions on power electronics Vol. 18; no. 5; pp. 1238 - 1243
Main Authors: Liang, Y.C., Samudra, G.S., Lim, A.J.D., Pick Hong Ong
Format: Journal Article
Language:English
Published: New York IEEE 01-09-2003
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Abstract This paper describes research work on the design and fabrication of a current sensor suitable for smart power integration in lateral insulated-gate bipolar transistor (LIGBT) structure. In general, the proposed design can also be used for various types of MOS-controlled bipolar transistor structures. Both the electron and hole current sensor layers are integrated in a concise form within the device structure. The sensing performance was further refined with the proposed flat-top doping profile achievable through a double-implantation, single-anneal and post-anneal-oxidation approach. The integrated structure was fabricated on silicon wafer with laboratory measurements performed to verify its electrical performance. The sensing ratio is maintained at a relatively constant level with a variation of within /spl plusmn/0.46% and /spl plusmn/1.2% (as a switching device), and /spl plusmn/0.85% and /spl plusmn/1.73% (as an amplifier device), respectively, when anode current and gate voltage vary. For operating temperature range of 300 K to 400 K, the sensor is able to maintain a sensing ratio within /spl plusmn/5.2% variation.
AbstractList This paper describes research work on the design and fabrication of current sensor suitable for smart power integration in lateral insulated-gate bipolar transistor (LIGBT) structure. In general, the proposed design can also be used for various types of MOS- controlled bipolar transistor structures. Both the electron and hole current sensor layers are integrated in a concise form within the device structure. The sensing performance was further refined with the proposed flat-top doping profile achievable through a double-implantation, single-anneal and post-anneal-oxidation approach. The integrated structure was fabricated on silicon wafer with laboratory measurements performed to verify its electrical performance. The sensing ratio is maintained at a relatively constant level with a variation of within ±0.46% and ±1.2% (as a switching device), and ±0.85% and ±1.73% (as an amplifier device), respectively, when anode current and gate voltage vary. For operating temperature range of 300 K to 400 K, the sensor is able to maintain a sensing ratio within ±5.2% variation. [PUBLICATION ABSTRACT]
This paper describes research work on the design and fabrication of a current sensor suitable for smart power integration in lateral insulated-gate bipolar transistor (LIGBT) structure. In general, the proposed design can also be used for various types of MOS-controlled bipolar transistor structures. Both the electron and hole current sensor layers are integrated in a concise form within the device structure. The sensing performance was further refined with the proposed flat-top doping profile achievable through a double-implantation, single-anneal and post-anneal-oxidation approach. The integrated structure was fabricated on silicon wafer with laboratory measurements performed to verify its electrical performance. The sensing ratio is maintained at a relatively constant level with a variation of within /spl plusmn/0.46% and /spl plusmn/1.2% (as a switching device), and /spl plusmn/0.85% and /spl plusmn/1.73% (as an amplifier device), respectively, when anode current and gate voltage vary. For operating temperature range of 300 K to 400 K, the sensor is able to maintain a sensing ratio within /spl plusmn/5.2% variation.
This paper describes research work on the design and fabrication of a current sensor suitable for smart power integration in lateral insulated-gate bipolar transistor (LIGBT) structure. In general, the proposed design can also be used for various types of MOS-controlled bipolar transistor structures. Both the electron and hole current sensor layers are integrated in a concise form within the device structure. The sensing performance was further refined with the proposed flat-top doping profile achievable through a double-implantation, single-anneal and post-anneal-oxidation approach. The integrated structure was fabricated on silicon wafer with laboratory measurements performed to verify its electrical performance. The sensing ratio is maintained at a relatively constant level with a variation of within +/-0.46% and +/-1.2% (as a switching device), and +/-0.85% and +/-1.73% (as an amplifier device), respectively, when anode current and gate voltage vary. For operating temperature range of 300 K to 400 K, the sensor is able to maintain a sensing ratio within +/-5.2% variation.
Author Samudra, G.S.
Liang, Y.C.
Lim, A.J.D.
Pick Hong Ong
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Snippet This paper describes research work on the design and fabrication of a current sensor suitable for smart power integration in lateral insulated-gate bipolar...
This paper describes research work on the design and fabrication of current sensor suitable for smart power integration in lateral insulated-gate bipolar...
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SubjectTerms Bipolar transistors
Charge carrier processes
Detection
Devices
Doping profiles
Electric power generation
Electronics
Fabrication
Insulated gate bipolar transistors
Insulation
Intelligent sensors
Operating temperature
Power
Semiconductor devices
Sensor phenomena and characterization
Sensors
Silicon
Temperature sensors
Title Accurate current sensor for lateral IGBT smart power integration
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