Identification of EL2 in GaAs

Combining electron paramagnetic resonance under optical excitation, deep level transient spectroscopy, electron irradiation, annealing, and quenching on LEC semi-insulating GaAs and lightly Si-doped material grown in the same way as the semi-insulating material, we have shown that (i) the irradiated...

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Published in:Applied physics letters Vol. 47; no. 9; pp. 970 - 972
Main Authors: VON BARDELEBEN, H. J, STIEVENARD, D, BOURGOIN, J. C, HUBER, A
Format: Journal Article
Language:English
Published: Melville, NY American Institute of Physics 01-11-1985
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Abstract Combining electron paramagnetic resonance under optical excitation, deep level transient spectroscopy, electron irradiation, annealing, and quenching on LEC semi-insulating GaAs and lightly Si-doped material grown in the same way as the semi-insulating material, we have shown that (i) the irradiated material contains two types of defects related to the antisite AsGa, one As∇Ga, present before irradiation, identified to EL2 from its characteristic photoquenching behavior and the other As*Ga, created by the irradiation, stable under photoexcitation; (ii) As∇Ga anneals partially under a 850 °C thermal treatment followed by a quench and the remaining defects are transformed into As*Ga; (iii) further annealing around 120 °C converts As*Ga into As∇Ga, the process being thermally activated (0.5±0.2 eV). From these results and using observations of absorption on vibrational modes of the C-As interstitial pair in electron irradiated material, we are able to conclude that As*Ga is the isolated antisite and As∇Ga, i.e., EL2, is a complex of an As antisite and an As interstitial.
AbstractList Combining electron paramagnetic resonance under optical excitation, deep level transient spectroscopy, electron irradiation, annealing, and quenching on LEC semi-insulating GaAs and lightly Si-doped material grown in the same way as the semi-insulating material, we have shown that (i) the irradiated material contains two types of defects related to the antisite AsGa, one As∇Ga, present before irradiation, identified to EL2 from its characteristic photoquenching behavior and the other As*Ga, created by the irradiation, stable under photoexcitation; (ii) As∇Ga anneals partially under a 850 °C thermal treatment followed by a quench and the remaining defects are transformed into As*Ga; (iii) further annealing around 120 °C converts As*Ga into As∇Ga, the process being thermally activated (0.5±0.2 eV). From these results and using observations of absorption on vibrational modes of the C-As interstitial pair in electron irradiated material, we are able to conclude that As*Ga is the isolated antisite and As∇Ga, i.e., EL2, is a complex of an As antisite and an As interstitial.
Combining electron paramagnetic resonance under optical excitation, deep level transient spectroscopy, electron irradiation, annealing, and quenching on LEC semi-insulating GaAs and lightly Si-doped material grown in the same way as the semi-insulating material, the authors have shown that (i) the irradiation material contains two types of defects related to the antisite As sub(Ga), one As super( (vector differential operator )@)dG sub(a), present before irradiation, identified to EL2 from its characteristic photoquenching behavior and the other As super(*)@)dG sub(a), created by the irradiation, stable under photoexcitation; (ii) As super( (vector differential operator )@)dG sub(a) anneals partially under a 850 degree C thermal treatment followed by a quench and the remaining defects are transformed into As super(*)@)dG sub(a); (iii) further annealing around 120 degree C converts As super(*)@)dG sub(a) into As super( (vector differential operator )@)dG sub(a), the process being thermally activated (0.5 plus or minus 0.2 eV).
It is pointed out that most GaAs materials contain a midgap electron trap, labeled EL2, which is the dominant effect compensating the doping impurities and leading to the semiinsulating characteristics of undoped materials. The present paper is concerned with observations which strongly suggest that EL2 is a complex formed by an antisite As(Ga) and a defect X in agreement with a recent suggestion made by Ikoma et al. (1985). On the basis of observations regarding the mobility of X and of data concerning irradiation induced defects, it is concluded that X is the interstitial As. (G.R.)
Author HUBER, A
VON BARDELEBEN, H. J
STIEVENARD, D
BOURGOIN, J. C
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10.1063/1.336284
10.1103/PhysRevB.28.3660
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10.1063/1.94930
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Issue 9
Keywords Gallium Arsenides
Complex defect
Deep level transient spectrometry
Annealing
Semiconductor materials
Antisite defect
Irradiation
Interstitial
Electron paramagnetic resonance
Inorganic compound
Electrons
Language English
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Snippet Combining electron paramagnetic resonance under optical excitation, deep level transient spectroscopy, electron irradiation, annealing, and quenching on LEC...
It is pointed out that most GaAs materials contain a midgap electron trap, labeled EL2, which is the dominant effect compensating the doping impurities and...
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SubjectTerms Color centers and other defects
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Electron paramagnetic resonance and relaxation
Exact sciences and technology
Magnetic resonances and relaxations in condensed matter, mössbauer effect
Physics
Title Identification of EL2 in GaAs
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