Modeling of dynamical processes in laser ablation

• Published in: Applied surface science Vol. 96-98; pp. 14 - 23
• Main Authors: Leboeuf, J.N., Chen, K.R., Donato, J.M., Geohegan, D.B., Liu, C.L., Puretzky, A.A., Wood, R.F.
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Amsterdam Elsevier B.V 01-04-1996; Elsevier Science
• Subjects: Condensed matter: electronic structure, electrical, magnetic, and optical properties; Cross-disciplinary physics: materials science; rheology; Electron and ion emission by liquids and solids; impact phenomena; Exact sciences and technology; Impact phenomena (including electron spectra and sputtering); Laser deposition; Laser-beam impact phenomena; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Physics; Physics of gases, plasmas and electric discharges; Physics of plasmas and electric discharges; Plasma applications; Theoretical study; Feathers; Laser ablation technique; Pulsed lasers; Sputtering; Film growth
• ISSN: 0169-4332; 1873-5584
• DOI: 10.1016/0169-4332(95)00372-X

Various physics and computational approaches have been developed to globally characterize phenomena important for film growth by pulsed-laser deposition of materials. These include thermal models of laser-solid target interactions that initiate the vapor plume, plume ionization and heating through laser absorption beyond local thermodynamic equilibrium mechanisms, hydrodynamic and collisional descriptions of plume transport, and molecular dynamics models of the interaction of plume particles with the deposition substrate.