A Thiazyl-Based Organic Ferromagnet

A Thiazyl-Based Organic Ferromagnet

The sulfur–nitrogen radical p‐O2NC6F4CNSSN. (see packing diagram) provides a rare example of an organic radical that orders ferromagnetically above 1 K. It is suggested that the near orthogonal nature of the singly occupied molecular orbitals of neighboring molecules is important for such behavior t...

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Bibliographic Details
Published in:Angewandte Chemie International Edition Vol. 42; no. 39; pp. 4782 - 4785
Main Authors: Alberola, Antonio, Less, Robert J., Pask, Christopher M., Rawson, Jeremy M., Palacio, Fernando, Oliete, Patricia, Paulsen, Carley, Yamaguchi, Akira, Farley, Robert D., Murphy, D. M.
Format: Journal Article
Language:English
Published: Weinheim WILEY-VCH Verlag 13-10-2003
WILEY‐VCH Verlag
Subjects:
ferromagnetism
magnetic properties
molecular magnetism
radical ions
radicals
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Summary:The sulfur–nitrogen radical p‐O2NC6F4CNSSN. (see packing diagram) provides a rare example of an organic radical that orders ferromagnetically above 1 K. It is suggested that the near orthogonal nature of the singly occupied molecular orbitals of neighboring molecules is important for such behavior to be observed.
Bibliography:ark:/67375/WNG-3ZXKR9TM-Z
We would like to thank the EPSRC (A.A., R.J.L., C.M.P., and R.D.F.), the CICYT (grant MAT2001-3507-C02-02), and the Gates Cambridge Trust (A.A.) for financial support, and the ESF program "Molecular Magnets" for partial support to the collaborative activities. We are grateful to Dr. N. Feeder for X-ray data collection and analysis and preparation of crystallographic data for deposit.
istex:C0D34EC073F229383441A4B87F21AA3107769D7B
ArticleID:ANIE200352194
We would like to thank the EPSRC (A.A., R.J.L., C.M.P., and R.D.F.), the CICYT (grant MAT2001‐3507‐C02‐02), and the Gates Cambridge Trust (A.A.) for financial support, and the ESF program “Molecular Magnets” for partial support to the collaborative activities. We are grateful to Dr. N. Feeder for X‐ray data collection and analysis and preparation of crystallographic data for deposit.
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ISSN:1433-7851
1521-3773
DOI:10.1002/anie.200352194