Laser wavelength dependence of extreme ultraviolet light and particle emissions from laser-produced lithium plasmas

Laser wavelength dependence of extreme ultraviolet light and particle emissions from laser-produced lithium plasmas

Maximum extreme ultraviolet (EUV) conversion efficiencies (CEs) of 2.3% and 1.8% were achieved in planar Li targets by using pulsed 2 ω and 1 ω Nd:YAG laser irradiation, respectively. In a forced recombination scheme, the total CE can be expected to be about 4%. The maximum kinetic energy of the lit...

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Bibliographic Details
Published in:Applied physics letters Vol. 93; no. 9; pp. 091502 - 091502-3
Main Authors: Nagano, Akihisa, Mochizuki, Takayasu, Miyamoto, Shuji, Amano, Sho
Format: Journal Article
Language:English
Published: United States American Institute of Physics 01-09-2008
Subjects:
CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS
EXTREME ULTRAVIOLET RADIATION
FREQUENCY DEPENDENCE
KINETIC ENERGY
LASER RADIATION
LITHIUM
LITHIUM IONS
MAGNETIC FIELDS
NEODYMIUM LASERS
PLASMA
PLASMA PRODUCTION
RECOMBINATION
TIN IONS
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Summary:Maximum extreme ultraviolet (EUV) conversion efficiencies (CEs) of 2.3% and 1.8% were achieved in planar Li targets by using pulsed 2 ω and 1 ω Nd:YAG laser irradiation, respectively. In a forced recombination scheme, the total CE can be expected to be about 4%. The maximum kinetic energy of the lithium ion debris was found to be less than 1 keV, indicating that mirror damage caused by lithium ion debris is more easily mitigated by using a magnetic field than for tin ions. These results suggest that a Li target is a reasonable candidate for an EUV lithography source.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.2975180