High-frequency short-pulsed metal plasma-immersion ion implantation or deposition using filtered DC vacuum-arc plasma
A new approach to the development of advanced coating deposition and ion implantation method including an application of filtered dc metal plasma and high-frequency short-pulsed negative bias voltage with a duty factor in the range of 10–99% are considered. The ion energy spectrum for different nega...
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Published in: | Surface & coatings technology Vol. 201; no. 15; pp. 6523 - 6525 |
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Elsevier B.V
23-04-2007
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Abstract | A new approach to the development of advanced coating deposition and ion implantation method including an application of filtered dc metal plasma and high-frequency short-pulsed negative bias voltage with a duty factor in the range of 10–99% are considered. The ion energy spectrum for different negative bias potential pulse durations (120–1100 ns) was measured. The chart of various methods of ion beam and plasma material treatment using high-frequency short pulse metal plasma immersion ion implantation or deposition depending on bias pulse duty factor and amplitude for Cu plasma is presented. The ion assisted coating deposition has been examined depending on samples conductivity and thickness, plasma concentration, pulse repetition rate, amplitude, and duty factor. |
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AbstractList | A new approach to the development of advanced coating deposition and ion implantation method including an application of filtered dc metal plasma and high-frequency short-pulsed negative bias voltage with a duty factor in the range of 10–99% are considered. The ion energy spectrum for different negative bias potential pulse durations (120–1100 ns) was measured. The chart of various methods of ion beam and plasma material treatment using high-frequency short pulse metal plasma immersion ion implantation or deposition depending on bias pulse duty factor and amplitude for Cu plasma is presented. The ion assisted coating deposition has been examined depending on samples conductivity and thickness, plasma concentration, pulse repetition rate, amplitude, and duty factor. A new approach to the development of advanced coating deposition and ion implantation method including an application of filtered dc metal plasma and high-frequency short-pulsed negative bias voltage with a duty factor in the range of 10-99% are considered. The ion energy spectrum for different negative bias potential pulse durations (120-1100ns) was measured. The chart of various methods of ion beam and plasma material treatment using high-frequency short pulse metal plasma immersion ion implantation or deposition depending on bias pulse duty factor and amplitude for Cu plasma is presented. The ion assisted coating deposition has been examined depending on samples conductivity and thickness, plasma concentration, pulse repetition rate, amplitude, and duty factor. A new approach to the development of advanced coating deposition and ion implantation method including an application of filtered dc metal plasma and high-frequency short-pulsed negative bias voltage with a duty factor in the range of 10-99% are considered. The ion energy spectrum for different negative bias potential pulse durations (120-1100 ns) was measured. The chart of various methods of ion beam and plasma material treatment using high-frequency short pulse metal plasma immersion ion implantation or deposition depending on bias pulse duty factor and amplitude for Cu plasma is presented. The ion assisted coating deposition has been examined depending on samples conductivity and thickness, plasma concentration, pulse repetition rate, amplitude, and duty factor. |
Author | Ryabchikov, A.I. Usov, Yu.P. Ryabchikov, I.A. Stepanov, I.B. |
Author_xml | – sequence: 1 givenname: A.I. surname: Ryabchikov fullname: Ryabchikov, A.I. – sequence: 2 givenname: I.A. surname: Ryabchikov fullname: Ryabchikov, I.A. email: rigal@npi.tpu.ru – sequence: 3 givenname: I.B. surname: Stepanov fullname: Stepanov, I.B. – sequence: 4 givenname: Yu.P. surname: Usov fullname: Usov, Yu.P. |
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Cites_doi | 10.1016/S0257-8972(99)00178-4 10.1016/S0257-8972(97)00091-1 10.1063/1.104318 10.1016/0168-583X(91)95559-V 10.1016/S0257-8972(97)00037-6 10.1063/1.339858 10.1016/S0257-8972(98)00769-5 10.1016/S0257-8972(00)00577-6 10.1016/S0040-6090(99)00242-4 10.1016/S0040-6090(01)01771-0 |
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References | Ryabchikov, Nasyrov, Kompaniets (bib9) 1990 Ryabchikov, Ryabchikov, Stepanov (bib13) 2005; 331–336 Ryabchikov (bib11) 1997; 96 Ryabchikov, Ryabchikov, Stepanov (bib12) 2005; 445–449 Brown, Godechot, Yu (bib3) 1991; 58 Liu, Jiang, Fu, Cheng, Wu, Yang (bib8) 1999; 349 Brown, Anders, Dickinson, MacGill, Monteiro (bib2) 1999; 112 Ryabchikov, Nasyrov (bib10) 1991; B61 Wang, Wong, Li, Chiah, Poon, Cheung, Ke (bib5) 2002; 405 Anders (bib4) 1997; 93 Zeng, Zhang, Tang, Tian, Chu (bib7) 1999; 115 Yu, Xia, Sun (bib6) 2000; 128–129 Conrad (bib1) 1987; 62 Brown (10.1016/j.surfcoat.2006.09.053_bib3) 1991; 58 Anders (10.1016/j.surfcoat.2006.09.053_bib4) 1997; 93 Wang (10.1016/j.surfcoat.2006.09.053_bib5) 2002; 405 Ryabchikov (10.1016/j.surfcoat.2006.09.053_bib11) 1997; 96 Brown (10.1016/j.surfcoat.2006.09.053_bib2) 1999; 112 Ryabchikov (10.1016/j.surfcoat.2006.09.053_bib10) 1991; B61 Conrad (10.1016/j.surfcoat.2006.09.053_bib1) 1987; 62 Liu (10.1016/j.surfcoat.2006.09.053_bib8) 1999; 349 Ryabchikov (10.1016/j.surfcoat.2006.09.053_bib12) 2005; 445–449 Zeng (10.1016/j.surfcoat.2006.09.053_bib7) 1999; 115 Ryabchikov (10.1016/j.surfcoat.2006.09.053_bib9) 1990 Ryabchikov (10.1016/j.surfcoat.2006.09.053_bib13) 2005; 331–336 Yu (10.1016/j.surfcoat.2006.09.053_bib6) 2000; 128–129 |
References_xml | – volume: 445–449 start-page: 78 year: 2005 ident: bib12 publication-title: J. Vac. contributor: fullname: Stepanov – volume: 128–129 start-page: 240 year: 2000 ident: bib6 publication-title: Surf. Coat. Technol. contributor: fullname: Sun – volume: 405 start-page: 304 year: 2002 ident: bib5 publication-title: Thin Solid Films contributor: fullname: Ke – volume: 112 start-page: 271 year: 1999 ident: bib2 publication-title: Surf. Coat. Technol. contributor: fullname: Monteiro – volume: 93 start-page: 157 year: 1997 ident: bib4 publication-title: Surf. Coat. Technol. contributor: fullname: Anders – year: 1990 ident: bib9 publication-title: Proc. of the Intern. Conf. Ion Implantation and Ion Beam Equipment, Elenite, Bulgaria contributor: fullname: Kompaniets – volume: 58 start-page: 1392 year: 1991 ident: bib3 publication-title: Appl. Phys. Lett. contributor: fullname: Yu – volume: 331–336 start-page: 78 year: 2005 ident: bib13 publication-title: J. Vac. contributor: fullname: Stepanov – volume: 62 start-page: 777 year: 1987 ident: bib1 publication-title: J. Appl. Phys. contributor: fullname: Conrad – volume: B61 start-page: 48 year: 1991 ident: bib10 publication-title: Nucl. Instrum. Methods Phys. Res. contributor: fullname: Nasyrov – volume: 96 start-page: 9 year: 1997 ident: bib11 publication-title: Surf. Coat. Technol. contributor: fullname: Ryabchikov – volume: 115 start-page: 234 year: 1999 ident: bib7 publication-title: Surf. Coat. Technol. contributor: fullname: Chu – volume: 349 start-page: 110 year: 1999 ident: bib8 publication-title: Thin Solid Films contributor: fullname: Yang – year: 1990 ident: 10.1016/j.surfcoat.2006.09.053_bib9 contributor: fullname: Ryabchikov – volume: 115 start-page: 234 year: 1999 ident: 10.1016/j.surfcoat.2006.09.053_bib7 publication-title: Surf. Coat. Technol. doi: 10.1016/S0257-8972(99)00178-4 contributor: fullname: Zeng – volume: 96 start-page: 9 year: 1997 ident: 10.1016/j.surfcoat.2006.09.053_bib11 publication-title: Surf. Coat. Technol. doi: 10.1016/S0257-8972(97)00091-1 contributor: fullname: Ryabchikov – volume: 58 start-page: 1392 year: 1991 ident: 10.1016/j.surfcoat.2006.09.053_bib3 publication-title: Appl. Phys. Lett. doi: 10.1063/1.104318 contributor: fullname: Brown – volume: B61 start-page: 48 year: 1991 ident: 10.1016/j.surfcoat.2006.09.053_bib10 publication-title: Nucl. Instrum. Methods Phys. Res. doi: 10.1016/0168-583X(91)95559-V contributor: fullname: Ryabchikov – volume: 93 start-page: 157 year: 1997 ident: 10.1016/j.surfcoat.2006.09.053_bib4 publication-title: Surf. Coat. Technol. doi: 10.1016/S0257-8972(97)00037-6 contributor: fullname: Anders – volume: 62 start-page: 777 year: 1987 ident: 10.1016/j.surfcoat.2006.09.053_bib1 publication-title: J. Appl. Phys. doi: 10.1063/1.339858 contributor: fullname: Conrad – volume: 112 start-page: 271 year: 1999 ident: 10.1016/j.surfcoat.2006.09.053_bib2 publication-title: Surf. Coat. Technol. doi: 10.1016/S0257-8972(98)00769-5 contributor: fullname: Brown – volume: 445–449 start-page: 78 year: 2005 ident: 10.1016/j.surfcoat.2006.09.053_bib12 publication-title: J. Vac. contributor: fullname: Ryabchikov – volume: 128–129 start-page: 240 year: 2000 ident: 10.1016/j.surfcoat.2006.09.053_bib6 publication-title: Surf. Coat. Technol. doi: 10.1016/S0257-8972(00)00577-6 contributor: fullname: Yu – volume: 331–336 start-page: 78 year: 2005 ident: 10.1016/j.surfcoat.2006.09.053_bib13 publication-title: J. Vac. contributor: fullname: Ryabchikov – volume: 349 start-page: 110 year: 1999 ident: 10.1016/j.surfcoat.2006.09.053_bib8 publication-title: Thin Solid Films doi: 10.1016/S0040-6090(99)00242-4 contributor: fullname: Liu – volume: 405 start-page: 304 year: 2002 ident: 10.1016/j.surfcoat.2006.09.053_bib5 publication-title: Thin Solid Films doi: 10.1016/S0040-6090(01)01771-0 contributor: fullname: Wang |
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Title | High-frequency short-pulsed metal plasma-immersion ion implantation or deposition using filtered DC vacuum-arc plasma |
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