AlGaAs/GaAs HBTs for 10-Gb/s ICs using a new base ohmic contact fabrication process
A new basic ohmic contact technology for AlGaAs/GaAs heterojunction bipolar transistors (HBTs) is presented. The effect of the device parameters on the high-frequency performance of HBT ICs for 10-Gb/s systems is analyzed, and it is shown that, at a cutoff frequency (f/sub T/) of 40 GHz or more, red...
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Published in: | IEEE transactions on electron devices Vol. 40; no. 1; pp. 25 - 31 |
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Main Authors: | , , , , , , |
Format: | Journal Article |
Language: | English |
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01-01-1993
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Abstract | A new basic ohmic contact technology for AlGaAs/GaAs heterojunction bipolar transistors (HBTs) is presented. The effect of the device parameters on the high-frequency performance of HBT ICs for 10-Gb/s systems is analyzed, and it is shown that, at a cutoff frequency (f/sub T/) of 40 GHz or more, reducing base resistance or collector capacitance is more effective than increasing f/sub T/ for obtaining high-frequency performance. A process is developed for fabricating base electrodes with a very low ohmic contact resistivity, approximately 10/sup -7/ Omega -cm/sup 2/, by using a AuZn/Mo/Au alloy, which provides the required high performance. Self-aligned AlGaAs/GaAs HBTs, with a 2.5- mu m*5- mu m emitter, using a AuZn/Mo/Au alloy base metal and an undoped GaAs collector, are shown to have an f/sub T/ and a maximum oscillation frequency of about 45 and 70 GHz, respectively, at 3.5 mA. An AGC amplifier with a 20-dB gain and a bandwidth of 13.7 GHz demonstrates stable performance.< > |
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AbstractList | A new basic ohmic contact technology for AlGaAs/GaAs heterojunction bipolar transistors (HBTs) is presented. The effect of the device parameters on the high-frequency performance of HBT ICs for 10-Gb/s systems is analyzed, and it is shown that, at a cutoff frequency ( < e1 > f < /e1 > (T)) of 40 GHz or more, reducing base resistance or collector capacitance is more effective than increasing < e1 > f < /e1 > (T ) for obtaining high-frequency performance. A process is developed for fabricating base electrodes with a very low ohmic contact resistivity, ~10(-7) Omicron-cm(2), by using a AuZn/Mo/Au alloy, which provides the required high performance. Self-aligned AlGaAs/GaAs HBTs, with a 2.5-mumx5-mum emitter, using a AuZn/Mo/Au alloy base metal and an undoped GaAs collector, are shown to have an < e1 > f < /e1 > (T) and a maximum oscillation frequency of about 45 and 70 GHz, respectively, at 3.5 mA. An AGC amplifier with a 20-dB gain and a bandwidth of 13.7 GHz demonstrates stable performance A new basic ohmic contact technology for AlGaAs/GaAs heterojunction bipolar transistors (HBTs) is presented. The effect of the device parameters on the high-frequency performance of HBT ICs for 10-Gb/s systems is analyzed, and it is shown that, at a cutoff frequency (f/sub T/) of 40 GHz or more, reducing base resistance or collector capacitance is more effective than increasing f/sub T/ for obtaining high-frequency performance. A process is developed for fabricating base electrodes with a very low ohmic contact resistivity, approximately 10/sup -7/ Omega -cm/sup 2/, by using a AuZn/Mo/Au alloy, which provides the required high performance. Self-aligned AlGaAs/GaAs HBTs, with a 2.5- mu m*5- mu m emitter, using a AuZn/Mo/Au alloy base metal and an undoped GaAs collector, are shown to have an f/sub T/ and a maximum oscillation frequency of about 45 and 70 GHz, respectively, at 3.5 mA. An AGC amplifier with a 20-dB gain and a bandwidth of 13.7 GHz demonstrates stable performance.< > |
Author | Mochizuki, K. Miyazaki, M. Mitani, K. Ishikawa, Y. Masuda, H. Kawata, M. Kusano, C. |
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Keywords | Analog circuit Ohmic contact Circuit design Computer simulation Performance characteristic Aluminium Gallium Arsenides Mixed Theoretical study Amplifier Cut off frequency Gallium Arsenides Microelectronic fabrication Integrated circuit Heterojunction transistor High frequency Performance |
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References | ref8 maziar (ref4) 1986; 7 ref9 ref3 ref6 ref11 ref10 ref5 ishibashi (ref7) 1990 ref2 ref1 |
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Snippet | A new basic ohmic contact technology for AlGaAs/GaAs heterojunction bipolar transistors (HBTs) is presented. The effect of the device parameters on the... |
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SubjectTerms | Applied sciences Capacitance Conductivity Cutoff frequency Electrodes Electronics Exact sciences and technology Gallium arsenide Gold alloys Heterojunction bipolar transistors Ohmic contacts Performance analysis Performance gain Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Transistors |
Title | AlGaAs/GaAs HBTs for 10-Gb/s ICs using a new base ohmic contact fabrication process |
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