Epitaxial growth of Ni on Cu( [formula omitted]) with the assistance of O-surfactant and its magnetism compared to Ni/Cu( [formula omitted])
The growth of Ni films deposited on a reconstructed (√2×2√2)R45° O/Cu(0 0 1) is examined. It is shown that deposition of Ni changes the surface symmetry to c(2 × 2) and that oxygen always floats on the film surface. No NiO is formed. Surface roughness decreases and the growth mode is closer to ideal...
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Published in: | Surface science Vol. 531; no. 1; pp. 53 - 67 |
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Main Authors: | , , , , , , , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
Lausanne
Elsevier B.V
10-05-2003
Amsterdam Elsevier Science New York, NY |
Subjects: | |
Online Access: | Get full text |
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Summary: | The growth of Ni films deposited on a reconstructed (√2×2√2)R45° O/Cu(0
0
1) is examined. It is shown that deposition of Ni changes the surface symmetry to c(2
×
2) and that oxygen always floats on the film surface. No NiO is formed. Surface roughness decreases and the growth mode is closer to ideal layer-by-layer, as compared to that of Ni/Cu(0
0
1) indicating a surfactant activity of oxygen. Furthermore, the critical thickness for dislocation formation is larger than that for Ni/Cu(0
0
1), which points to a less defective film structure. The improved growth patterns are accompanied by a shift of the spin reorientation transition from in- to out-of-film plane by about 5 monolayers. In the film plane, the easy axis of the magnetization switches from the [1
1
0] direction for Ni/Cu(0
0
1), to the [1
0
0] direction for Ni on preoxidized Cu. We attribute these characteristics to modifications of the film surface by the floating oxygen. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0039-6028 1879-2758 |
DOI: | 10.1016/S0039-6028(03)00438-2 |