PREVAIL e-beam stepper alpha tool
PREVAIL is the high throughput e-beam projection approach to NGL, which IBM is pursuing in cooperation with Nikon as alliance partner. Key lithographic building blocks of the technology have been demonstrated experimentally with a proof-of-concept (POC) system and results have been reported earlier...
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| Published in: | Microelectronic engineering Vol. 57; pp. 163 - 172 |
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| Main Authors: | , , , , , , , , , , , , , , , , , , , , , , , , , , |
| Format: | Journal Article Conference Proceeding |
| Language: | English |
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Amsterdam
Elsevier B.V
01-09-2001
Elsevier Science |
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| Abstract | PREVAIL is the high throughput e-beam projection approach to NGL, which IBM is pursuing in cooperation with Nikon as alliance partner. Key lithographic building blocks of the technology have been demonstrated experimentally with a proof-of-concept (POC) system and results have been reported earlier at MNE 99 and elsewhere. This paper reports on the implementation of the PREVAIL technology in a production-level e-beam stepper. The architecture and writing strategy of the tool together with design features of the various tool subsystems are described. |
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| AbstractList | PREVAIL is the high throughput e-beam projection approach to NGL, which IBM is pursuing in cooperation with Nikon as alliance partner. Key lithographic building blocks of the technology have been demonstrated experimentally with a proof-of-concept (POC) system and results have been reported earlier at MNE 99 and elsewhere. This paper reports on the implementation of the PREVAIL technology in a production-level e-beam stepper. The architecture and writing strategy of the tool together with design features of the various tool subsystems are described. copyright 2001 Elsevier Science B.V. All rights reserved. PREVAIL is the high throughput e-beam projection approach to NGL, which IBM is pursuing in cooperation with Nikon as alliance partner. Key lithographic building blocks of the technology have been demonstrated experimentally with a proof-of-concept (POC) system and results have been reported earlier at MNE 99 and elsewhere. This paper reports on the implementation of the PREVAIL technology in a production-level e-beam stepper. The architecture and writing strategy of the tool together with design features of the various tool subsystems are described. |
| Author | Kojima, S. Suzuki, K. Tressler, E.V. Morita, K. Pfeiffer, H.C. Doran, S.K. Golladay, S.D. Tanimoto, A. Sogard, M. Robinson, C.F. Shimizu, H. Gordon, M.S. Kawata, S. Yamaguchi, T. Pinckney, D.J. Miura, T. Okino, T. Lieberman, J.E. Stickel, W. Varnell, G. Rockrohr, J.D. Okamoto, K. Kendall, R.A. Suzuki, S.C. Novak, W.T. Dhaliwal, R.S. Quickle, R.J. |
| Author_xml | – sequence: 1 givenname: H.C. surname: Pfeiffer fullname: Pfeiffer, H.C. email: hpfeiffe@us.ibm.com organization: IBM Microelectronics, Semiconductor Research and Development Center, East Fishkill, ZIP AP1, 1580 Route 52, Hopewell Junction, NY 12533, USA – sequence: 2 givenname: R.S. surname: Dhaliwal fullname: Dhaliwal, R.S. organization: IBM Microelectronics, Semiconductor Research and Development Center, East Fishkill, ZIP AP1, 1580 Route 52, Hopewell Junction, NY 12533, USA – sequence: 3 givenname: S.D. surname: Golladay fullname: Golladay, S.D. organization: IBM Microelectronics, Semiconductor Research and Development Center, East Fishkill, ZIP AP1, 1580 Route 52, Hopewell Junction, NY 12533, USA – sequence: 4 givenname: S.K. surname: Doran fullname: Doran, S.K. organization: IBM Microelectronics, Semiconductor Research and Development Center, East Fishkill, ZIP AP1, 1580 Route 52, Hopewell Junction, NY 12533, USA – sequence: 5 givenname: M.S. surname: Gordon fullname: Gordon, M.S. organization: IBM Microelectronics, Semiconductor Research and Development Center, East Fishkill, ZIP AP1, 1580 Route 52, Hopewell Junction, NY 12533, USA – sequence: 6 givenname: R.A. surname: Kendall fullname: Kendall, R.A. organization: IBM Microelectronics, Semiconductor Research and Development Center, East Fishkill, ZIP AP1, 1580 Route 52, Hopewell Junction, NY 12533, USA – sequence: 7 givenname: J.E. surname: Lieberman fullname: Lieberman, J.E. organization: IBM Microelectronics, Semiconductor Research and Development Center, East Fishkill, ZIP AP1, 1580 Route 52, Hopewell Junction, NY 12533, USA – sequence: 8 givenname: D.J. surname: Pinckney fullname: Pinckney, D.J. organization: IBM Microelectronics, Semiconductor Research and Development Center, East Fishkill, ZIP AP1, 1580 Route 52, Hopewell Junction, NY 12533, USA – sequence: 9 givenname: R.J. surname: Quickle fullname: Quickle, R.J. organization: IBM Microelectronics, Semiconductor Research and Development Center, East Fishkill, ZIP AP1, 1580 Route 52, Hopewell Junction, NY 12533, USA – sequence: 10 givenname: C.F. surname: Robinson fullname: Robinson, C.F. organization: IBM Microelectronics, Semiconductor Research and Development Center, East Fishkill, ZIP AP1, 1580 Route 52, Hopewell Junction, NY 12533, USA – sequence: 11 givenname: J.D. surname: Rockrohr fullname: Rockrohr, J.D. organization: IBM Microelectronics, Semiconductor Research and Development Center, East Fishkill, ZIP AP1, 1580 Route 52, Hopewell Junction, NY 12533, USA – sequence: 12 givenname: W. surname: Stickel fullname: Stickel, W. organization: IBM Microelectronics, Semiconductor Research and Development Center, East Fishkill, ZIP AP1, 1580 Route 52, Hopewell Junction, NY 12533, USA – sequence: 13 givenname: E.V. surname: Tressler fullname: Tressler, E.V. organization: IBM Microelectronics, Semiconductor Research and Development Center, East Fishkill, ZIP AP1, 1580 Route 52, Hopewell Junction, NY 12533, USA – sequence: 14 givenname: A. surname: Tanimoto fullname: Tanimoto, A. organization: Nikon Corporation, Ohi Plant, 6-3 Nishi-Ohi 1-Chome, Shinagawa-Ku, Tokyo 140, Japan – sequence: 15 givenname: T. surname: Yamaguchi fullname: Yamaguchi, T. organization: Nikon Corporation, Ohi Plant, 6-3 Nishi-Ohi 1-Chome, Shinagawa-Ku, Tokyo 140, Japan – sequence: 16 givenname: K. surname: Okamoto fullname: Okamoto, K. organization: Nikon Corporation, Ohi Plant, 6-3 Nishi-Ohi 1-Chome, Shinagawa-Ku, Tokyo 140, Japan – sequence: 17 givenname: K. surname: Suzuki fullname: Suzuki, K. organization: Nikon Corporation, Ohi Plant, 6-3 Nishi-Ohi 1-Chome, Shinagawa-Ku, Tokyo 140, Japan – sequence: 18 givenname: T. surname: Miura fullname: Miura, T. organization: Nikon Corporation, Ohi Plant, 6-3 Nishi-Ohi 1-Chome, Shinagawa-Ku, Tokyo 140, Japan – sequence: 19 givenname: T. surname: Okino fullname: Okino, T. organization: Nikon Corporation, Ohi Plant, 6-3 Nishi-Ohi 1-Chome, Shinagawa-Ku, Tokyo 140, Japan – sequence: 20 givenname: S. surname: Kawata fullname: Kawata, S. organization: Nikon Corporation, Ohi Plant, 6-3 Nishi-Ohi 1-Chome, Shinagawa-Ku, Tokyo 140, Japan – sequence: 21 givenname: K. surname: Morita fullname: Morita, K. organization: Nikon Corporation, Ohi Plant, 6-3 Nishi-Ohi 1-Chome, Shinagawa-Ku, Tokyo 140, Japan – sequence: 22 givenname: S.C. surname: Suzuki fullname: Suzuki, S.C. organization: Nikon Corporation, Ohi Plant, 6-3 Nishi-Ohi 1-Chome, Shinagawa-Ku, Tokyo 140, Japan – sequence: 23 givenname: H. surname: Shimizu fullname: Shimizu, H. organization: Nikon Corporation, Ohi Plant, 6-3 Nishi-Ohi 1-Chome, Shinagawa-Ku, Tokyo 140, Japan – sequence: 24 givenname: S. surname: Kojima fullname: Kojima, S. organization: Nikon Corporation, Ohi Plant, 6-3 Nishi-Ohi 1-Chome, Shinagawa-Ku, Tokyo 140, Japan – sequence: 25 givenname: G. surname: Varnell fullname: Varnell, G. organization: Nikon Research Corporation of America, 1399 Shoreway Road, Belmont, CA 94002, USA – sequence: 26 givenname: W.T. surname: Novak fullname: Novak, W.T. organization: Nikon Research Corporation of America, 1399 Shoreway Road, Belmont, CA 94002, USA – sequence: 27 givenname: M. surname: Sogard fullname: Sogard, M. organization: Nikon Research Corporation of America, 1399 Shoreway Road, Belmont, CA 94002, USA |
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| Cites_doi | 10.1116/1.591082 10.1116/1.1415509 10.1016/S0167-9317(00)00266-5 10.1116/1.591083 10.1116/1.583399 |
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| Copyright | 2001 Elsevier Science B.V. 2001 INIST-CNRS |
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| Keywords | PREVAIL technology Alpha tool design e-Beam stepper Instrumentation Electron optics Implementation |
| Language | English |
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| References | Gordon (BIB3) 1999; 17 W.T. Novak, D. Watson, Y. Yoda, Extended Abstracts of ASPE (2000) in press. S.D. Golladay et al., J. Vac. Sci. Technol. B 19(6) (2000) in press. Essig, Pfeiffer (BIB4) 1986; 4 Golladay (BIB2) 1999; 17 W. Stickel, G.O. Langner, J. Vac. Sci. Technol. B 19(6) (2000) in press. Pfeiffer (BIB1) 2000; 53 Gordon (10.1016/S0167-9317(01)00508-1_BIB3) 1999; 17 10.1016/S0167-9317(01)00508-1_BIB7 Golladay (10.1016/S0167-9317(01)00508-1_BIB2) 1999; 17 10.1016/S0167-9317(01)00508-1_BIB5 10.1016/S0167-9317(01)00508-1_BIB6 Essig (10.1016/S0167-9317(01)00508-1_BIB4) 1986; 4 Pfeiffer (10.1016/S0167-9317(01)00508-1_BIB1) 2000; 53 |
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| SubjectTerms | Alpha tool design Beam optics e-Beam stepper Electromagnetism; electron and ion optics Exact sciences and technology Fundamental areas of phenomenology (including applications) Physics PREVAIL technology |
| Title | PREVAIL e-beam stepper alpha tool |
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