Energetic deposition of carbon clusters with preferred orientation using a new mixed mode cathodic arc – Sputtering process

• Published in: Carbon (New York) Vol. 48; no. 3; pp. 918 - 921
• Main Authors: Lattemann, M., Moafi, A., Bilek, M.M.M., McCulloch, D.G., McKenzie, D.R.
• Format: Journal Article
• Language: English
• Published: Kidlington Elsevier Ltd 01-03-2010; Elsevier
• Subjects: Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Fullerenes and related materials; diamonds, graphite; Materials science; Physics; Specific materials; Conduction; Films; Macroparticle; Growth; Pulsations; Carbon; Preferred orientation; Deposition; Mechanism; Sputtering; Substrates; Glow discharges
• ISSN: 0008-6223; 1873-3891
• DOI: 10.1016/j.carbon.2009.10.029

Carbon films were produced by triggering a cathodic arc from a magnetron glow discharge by the application of a high voltage pulse to the target. The arc is quenched rapidly to prevent the formation of large macroparticles normally produced by cathodic arcs. The films are smooth and, when grown with negative substrate bias, they contain graphitic nano-clusters which are preferentially oriented with their
c-axis normal to the film surface. This orientation gives films with high in-plane conduction. We propose a mechanism for the formation of these oriented layers in which the clusters are charged, accelerated electrostatically and flattened on impact onto the growth surface.