Tiered deposition of sub-5 nm ferroelectric Hf1-xZrxO2 films on metal and semiconductor substrates

• Published in: Applied physics letters Vol. 112; no. 19
• Main Authors: Walters, Glen, Shekhawat, Aniruddh, Rudawski, Nicholas G., Moghaddam, Saeed, Nishida, Toshikazu
• Format: Journal Article
• Language: English
• Published: 07-05-2018
• ISSN: 0003-6951; 1077-3118
• DOI: 10.1063/1.5027516

Using a tiered deposition approach, Hf1-xZrxO2 (HZO) films with varying atomic layer deposition (ALD) cycles from 36 to 52 cycles were grown on Ge, Ir, and TiN substrates in single runs and annealed at 500 °C. 40 ALD cycle films grown on Ir exhibit a switched polarization (Psw) of 13 μC/cm2, while those grown on Ge and TiN did not exhibit measurable Psw values until 44 and 52 ALD cycles, respectively. High-resolution cross-sectional transmission electron microscopy confirmed these results; the ferroelectric films are crystalline with defined lattice fringes, while non-ferroelectric films remain amorphous. 52 ALD cycle 1:1 HZO grown on Ge had the highest Psw of all the films fabricated at 39 μC/cm2, while the 1:1 HZO grown on TiN displayed continuous wake-up and no fatigue up to 1010 cycles with the Psw increasing from <1 μC/cm2 to 21 μC/cm2.