RF power absorption by plasma of low pressure low power inductive discharge located in the external magnetic field

• Published in: AIP advances Vol. 8; no. 3; pp. 035217 - 035217-29
• Main Authors: Kralkina, E. A., Rukhadze, A. A., Nekliudova, P. A., Pavlov, V. B., Petrov, A. K., Vavilin, K. V.
• Format: Journal Article
• Language: English
• Published: AIP Publishing LLC 01-03-2018
• ISSN: 2158-3226; 2158-3226
• DOI: 10.1063/1.5023631

Present paper is aimed to reveal experimentally and theoretically the influence of magnetic field strength, antenna shape, pressure, operating frequency and geometrical size of plasma sources on the ability of plasma to absorb the RF power characterized by the equivalent plasma resistance for the case of low pressure RF inductive discharge located in the external magnetic field. The distinguishing feature of the present paper is the consideration of the antennas that generate not only current but charge on the external surface of plasma sources. It is shown that in the limited plasma source two linked waves can be excited. In case of antennas generating only azimuthal current the waves can be attributed as helicon and TG waves. In the case of an antenna with the longitudinal current there is a surface charge on the side surface of the plasma source, which gives rise to a significant increase of the longitudinal and radial components of the RF electric field as compared with the case of the azimuthal antenna current.