Three-Dimensional Electrostatics- and Atomistic Doping-Induced Variability of RTN Time Constants in Nanoscale MOS Devices-Part I: Physical Investigation

This paper presents a detailed simulation analysis of the impact of 3-D electrostatics and atomistic doping on the variability of the random telegraph noise (RTN) time constants in nanoscale MOS devices. Results on a template decananometer Flash cell show that both the effects contribute to a large...

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Bibliographic Details
Published in:IEEE transactions on electron devices Vol. 59; no. 9; pp. 2488 - 2494
Main Authors: Castellani, Niccolò, Monzio Compagnoni, Christian, Mauri, Aurelio, Spinelli, Alessandro S., Lacaita, Andrea L.
Format: Journal Article
Language:English
Published: New York, NY IEEE 01-09-2012
Institute of Electrical and Electronics Engineers
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Summary:This paper presents a detailed simulation analysis of the impact of 3-D electrostatics and atomistic doping on the variability of the random telegraph noise (RTN) time constants in nanoscale MOS devices. Results on a template decananometer Flash cell show that both the effects contribute to a large statistical dispersion of the capture/emission time constants of oxide traps placed at the same distance from the silicon surface, mainly due to nonuniform channel inversion. The statistical dispersion has an orders-of-magnitude increase when moving from the on-state to the subthreshold cell regimes and has major implications on the spectroscopic investigation of RTN traps, as will be discussed in Part II of this work.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2012.2202910