Three-Dimensional Electrostatics- and Atomistic Doping-Induced Variability of RTN Time Constants in Nanoscale MOS Devices-Part I: Physical Investigation
This paper presents a detailed simulation analysis of the impact of 3-D electrostatics and atomistic doping on the variability of the random telegraph noise (RTN) time constants in nanoscale MOS devices. Results on a template decananometer Flash cell show that both the effects contribute to a large...
Saved in:
Published in: | IEEE transactions on electron devices Vol. 59; no. 9; pp. 2488 - 2494 |
---|---|
Main Authors: | , , , , |
Format: | Journal Article |
Language: | English |
Published: |
New York, NY
IEEE
01-09-2012
Institute of Electrical and Electronics Engineers |
Subjects: | |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Summary: | This paper presents a detailed simulation analysis of the impact of 3-D electrostatics and atomistic doping on the variability of the random telegraph noise (RTN) time constants in nanoscale MOS devices. Results on a template decananometer Flash cell show that both the effects contribute to a large statistical dispersion of the capture/emission time constants of oxide traps placed at the same distance from the silicon surface, mainly due to nonuniform channel inversion. The statistical dispersion has an orders-of-magnitude increase when moving from the on-state to the subthreshold cell regimes and has major implications on the spectroscopic investigation of RTN traps, as will be discussed in Part II of this work. |
---|---|
ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/TED.2012.2202910 |