Far ultraviolet reflectance variation of MgF2-protected aluminum films under controlled exposure to the main components of the atmosphere

Far ultraviolet (FUV) reflectance measurements on in situ deposited MgF2-overcoated aluminum films and on the same films after exposure to controlled doses of air show that a reflectance degradation up to 10% takes place due to exposure. We applied increasing doses of molecular nitrogen, molecular o...

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Bibliographic Details
Published in:	Thin solid films Vol. 497; no. 1-2; pp. 249 - 253
Main Authors:	Fernández-Perea, M., Aznárez, J.A., Calvo-Angós, J., Larruquert, J.I., Méndez, J.A.
Format:	Journal Article
Language:	English
Published:	Lausanne Elsevier B.V 21-02-2006 Elsevier Science
Subjects:	Aluminum Condensed matter: electronic structure, electrical, magnetic, and optical properties Evaporation Exact sciences and technology Fluorides Optical coatings Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Other nonmetallic inorganics Other nonmetals Physics Visible and ultraviolet spectra Evaporation Fluorides Aluminum Optical coatings Inorganic compounds Physical radiation effects Controlled atmospheres Binary compounds Aluminium Magnesium fluorides Experimental study Transmittance Coated material Thin films Degradation Reflectivity Ultraviolet radiation
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