High quality molecular beam epitaxial regrowth of ZnSe on Se-modified (100) GaAs surfaces
We show that high quality MBE regrowth of ZnSe can be achieved on (100) GaAs surfaces that have been passivated outside the regrowth chamber with aqueous selenides. Good epitaxial regrowth of ZnSe on these Se-modified GaAs surfaces could be seen by reflection high energy electron diffraction and lat...
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Published in: | Japanese Journal of Applied Physics Vol. 30; no. 3; pp. 447 - 450 |
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Main Authors: | , , , |
Format: | Journal Article |
Language: | English |
Published: |
Tokyo
Japanese journal of applied physics
01-03-1991
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Subjects: | |
Online Access: | Get full text |
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Summary: | We show that high quality MBE regrowth of ZnSe can be achieved on (100) GaAs surfaces that have been passivated outside the regrowth chamber with aqueous selenides. Good epitaxial regrowth of ZnSe on these Se-modified GaAs surfaces could be seen by reflection high energy electron diffraction and lattice images obtained by transmission electron microscopy reveal GaAs/ZnSe interfaces free of structural defects. We also show that these regrown interfaces are of high electronic quality with photoluminescence intensity measurements. The relatively low regrowth temperatures (270 and 350°C) combined with the wide band gap of ZnSe should make our scheme attractive for regrowth on many GaAs-based devices. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/jjap.30.447 |