Homoepitaxial ZnO film growth on vertically aligned ZnO nanorods

• Published in: Journal of crystal growth Vol. 303; no. 2; pp. 580 - 584
• Main Authors: Park, S.-H., Seo, S.-Y., Kim, S.-H., Han, S.-W.
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier B.V 01-05-2007; Elsevier
• Subjects: A1. Crystal structure; A3. Homoepitaxial growth; A3. MOCVD; A3. Thin film; B1. Nanorod; B1. ZnO; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Nanoscale materials and structures: fabrication and characterization; Other topics in nanoscale materials and structures; Physics; Single-crystal and powder diffraction; Structure of solids and liquids; crystallography; Theory and models of film growth; X-ray diffraction and scattering; 78.55.Et; A3. Homoepitaxial growth; 81.07.Bc; A3. Thin film; B1. Nanorod; A1. Crystal structure; B1. ZnO; 81.15.Gh; A3. MOCVD; 73.63.Bd; Homoepitaxy; Atomic force microscopy; Inorganic compounds; Catalysts; Hybrid material; Roughness; Crystal growth from vapors; XRD; Thin films; Al. Crystal structure; A3. Homoepitaxial growth; A3. MOCVD; A3. Thin film; Bl. Nanorod; Bl. ZnO; Nanorod; Aluminium oxides; Crystal structure; Scanning electron microscopy; Electronic properties; Transition element compounds; MOCVD; 81.07.Bc; 81.15.Gh; 73.63.Bd; 78.55.Et; Electron field emission; Film growth; Zinc oxides; Transmission electron microscopy; II-VI semiconductors; Growth mechanism; Wurtzite structure; Microstructure; Nanostructured materials
• ISSN: 0022-0248; 1873-5002
• DOI: 10.1016/j.jcrysgro.2006.12.079

We present a 2D ZnO film epitaxially grown on 1D ZnO nanorods with catalyst-free metal-organic chemical vapor deposition. Vertically aligned ZnO nanorods were synthesized on
Al
2
O
3
substrates, and subsequently, a ZnO film was deposited on the pre-grown ZnO nanorods
in situ. The dimensional ZnO growth was controlled by the growth chamber pressure. High-resolution X-ray diffraction and field-emission transmission electron microscope measurements demonstrated that the ZnO film was epitaxially grown on the pre-grown ZnO nanorods, and that the ZnO film/nanorods structures had a well-ordered wurtzite structure. The ZnO film on ZnO nanorods/Al
2O
3 had a uniform thickness with an average minimum thickness of
0.25
μ
m
and the root-mean-square roughness of 3
nm determined by Filed-emission scanning electron microscope and an atomic force microscopy measurements, respectively. These ZnO film/nanorods hybrid structures can be used as nanobuilding blocks for nanodevice applications.