Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography

We have demonstrated a hybrid extreme ultraviolet (EUV) multilayer mirror for 6.x nm radiation that provides selective suppression for infrared (IR) radiation. The mirror consists of an IR-transparent LaN∕B multilayer stack which is used as EUV-reflective coating and antireflective (AR) coating to s...

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Bibliographic Details
Published in:	Applied physics letters Vol. 103; no. 22
Main Authors:	Medvedev, V. V., van de Kruijs, R. W. E., Yakshin, A. E., Novikova, N. N., Krivtsun, V. M., Louis, E., Yakunin, A. M., Bijkerk, F.
Format:	Journal Article
Language:	English
Published:	Melville American Institute of Physics 25-11-2013
Subjects:	Applied physics Carbon dioxide CARBON DIOXIDE LASERS CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS Coating CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY EXTREME ULTRAVIOLET RADIATION INFRARED RADIATION LANTHANUM NITRIDES Lasers LAYERS Lithography LOCAL AREA NETWORKS MIRRORS Multilayers Selectivity Spectra Ultraviolet
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Summary:	We have demonstrated a hybrid extreme ultraviolet (EUV) multilayer mirror for 6.x nm radiation that provides selective suppression for infrared (IR) radiation. The mirror consists of an IR-transparent LaN∕B multilayer stack which is used as EUV-reflective coating and antireflective (AR) coating to suppress IR. The AR coating can be optimized to suppress CO2 laser radiation at the wavelength of 10.6 μm, which is of interest for application in next-generation EUV lithography systems.
Bibliography:	ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23
ISSN:	0003-6951 1077-3118
DOI:	10.1063/1.4837335