Physical-chemical properties of silicon carbonitride films prepared using laser-plasma deposition from hexamethyldisilazane

• Published in: Glass physics and chemistry Vol. 41; no. 2; pp. 232 - 236
• Main Authors: Demin, V. N., Smirnova, T. P., Borisov, V. O., Grachev, G. N., Smirnov, A. L., Khomyakov, M. N.
• Format: Journal Article
• Language: English
• Published: Moscow Pleiades Publishing 01-03-2015; Springer Nature B.V
• Subjects: Activation; Alloys; Carbon dioxide lasers; Ceramics; Characterization and Evaluation of Materials; Chemical vapor deposition; Chemistry and Materials Science; Coatings; Composites; Deposition; Glass; Materials Science; Natural Materials; Physical Chemistry; Plasma (physics); Silicon carbonitride; Stainless steels; chemical structure; laser plasma; SiCN coatings; structure
• ISSN: 1087-6596; 1608-313X
• DOI: 10.1134/S1087659615020042

A new method of the plasma chemical vapor deposition with the activation of the initial compounds by the plasma of the CO
2
laser in the high-speed gas flow has been applied for the synthesis of silicon carbonitride SiCN films on a substrate of stainless steel and instrumental alloys using hexamethyldisilazane vapors. The preparation of the coatings of the laser-plasma deposition in the variants of the chamber and non-chamber deposition has been studied. The properties of the prepared coatings have been studied by the methods of IR and Raman spectroscopy, atomic-force microscopy, and XRD-analysis analysis. The studies of the structure of the films using diffraction synchrotron radiation showed that the prepared silicon carbonitride coatings are X-ray amorphous. The ratio of the Si-C/Si-N bonds in coatings increases with the increase in the substrate temperature. The microhardness of the prepared coatings on stainless steel substrates is 15–25 GPa.