The influence of the conditions of synthesis on the composition and mechanical properties of silicon oxycarbonitride nanocomposite films

• Published in: Protection of metals and physical chemistry of surfaces Vol. 53; no. 2; pp. 253 - 260
• Main Authors: Fainer, N. I., Plekhanov, A. G., Khomyakov, M. N., Maksimovskiy, E. A., Rumyantsev, Yu. M.
• Format: Journal Article
• Language: English
• Published: Moscow Pleiades Publishing 01-03-2017; Springer Nature B.V
• Subjects: Characterization and Evaluation of Materials; Chemical composition; Chemical synthesis; Chemical vapor deposition; Chemistry and Materials Science; Composition effects; Corrosion and Coatings; Gas mixtures; Gases; Hardness; Hydrogenation; Industrial Chemistry/Chemical Engineering; Inorganic Chemistry; Investigations; Materials Science; Mechanical properties; Metallic Materials; Modulus of elasticity; Nanocomposites; Nanoindentation; Nanoscale and Nanostructured Materials and Coatings; Nanostructured materials; Nitrogen; Nitrous oxide; Oxygen; Phase composition; Plasma; Ratios; Reagents; Silicon; Synthesis; Synthesis (chemistry); Temperature; Tribology; 1,1,1,3,3,3-hexamethyldisilazane; Young’s modulus; hardness; nanocomposite films; silicon oxycarbonitride; nanoindentation; 1,1,3,3-tetramethyldisilazane
• ISSN: 2070-2051; 2070-206X
• DOI: 10.1134/S2070205117020095

Dielectric films of hydrogenated silicon oxycarbonitride SiC
x
N
y
O
z
:H were prepared by plasmaenhanced chemical vapor deposition using gas mixtures of 1,1,1,3,3,3-hexamethyldisilazane (HMDS) or 1,1,3,3-tetramethyldisilazane (TMDS) with oxygen and nitrogen in the temperature range of 373–973 K. The effect of the conditions of synthesis on the chemical and phase composition of the films was studied, in the amorphous part of which nanocrystals belonging to the phases of the Si–C–N system α-Si
3
N
4
, α-Si
3–
x
C
x
N
4
, and graphite were distributed. To measure the hardness and Young’s modulus, the nanoindentation method was used. The influence that the synthesis temperature and nitrogen-to-oxygen ratio in the initial gas mixtures HMDS + O
2
+
x
N
2
and TMDS + O
2
+
x
N
2
have on the hardness and Young’s modulus of the resulting SiC
x
N
y
O
z
:H films was investigated. The maximum obtained values of these parameters were 20.4 and 201.5 GPa, respectively.