Optimizing energy storage performance of ALD YSZ thin film devices via yttrium concentration variations

In the last decade, research has focused on fabricating new materials to accelerate the development of energy storage devices. In this work, metal-electrolyte-metal (Au-YSZ-Ru) structures were fabricated on silicon substrates using atomic layer deposition, sputtering, and thermal evaporation techniq...

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Bibliographic Details

Published in:	Journal of energy storage Vol. 73; p. 108966
Main Authors:	Romo, Oscar, Lucero, Daniela, Iñiguez, Enrique, Soto, Gerardo, Contreras, Oscar, Tiznado, Hugo
Format:	Journal Article
Language:	English
Published:	Elsevier Ltd 10-12-2023
Subjects:	Atomic layer deposition Faradaic reactions Ionic conductivity Oxygen storage Sputtering Thermal evaporation Yttria-stabilized zirconia Atomic layer deposition Oxygen storage Faradaic reactions Yttria-stabilized zirconia Ionic conductivity Sputtering Thermal evaporation
Online Access:	Get full text
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