Plasma-Deposited Ru-Based Thin Films for Photoelectrochemical Water Splitting

Plasma-enhanced chemical vapor deposition (PECVD) was used to produce new Ru-based thin catalytic films. The surface molecular structure of the films was examined by X-ray photoelectron spectroscopy (XPS). To determine the electro- and photoelectrochemical properties, the oxygen evolution reaction (...

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Bibliographic Details

Published in:	Catalysts Vol. 10; no. 3; p. 278
Main Authors:	Lukasz Jozwiak, Jacek Balcerzak, Jacek Tyczkowski
Format:	Journal Article
Language:	English
Published:	MDPI AG 01-03-2020
Subjects:	oxygen evolution reaction plasma deposition ruthenium oxide thin-film catalyst water splitting
Online Access:	Get full text
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