Rapid fabrication technique of nano/microfluidic device with high mechanical stability utilizing two-step soft lithography

We established a rapid fabrication technique utilizing two-step soft lithography to realize rigid nano/microfluidic devices which have high mechanical and thermal stability, good chemical resistance and replication accuracy. The proposed technique enables the production of rigid nano/micro structure...

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Published in:Sensors and actuators. B, Chemical Vol. 201; pp. 407 - 412
Main Authors: Mogi, Katsuo, Sugii, Yasuhiko, Yamamoto, Takatoki, Fujii, Teruo
Format: Journal Article
Language:English
Published: Elsevier B.V 01-10-2014
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Abstract We established a rapid fabrication technique utilizing two-step soft lithography to realize rigid nano/microfluidic devices which have high mechanical and thermal stability, good chemical resistance and replication accuracy. The proposed technique enables the production of rigid nano/micro structures including inlet and outlet ports by utilizing a mold master made from a soft material, conveniently and inexpensively. A device made from a thermosetting epoxy resin instead of a hard material showed a high replication accuracy, even with a high-aspect-ratio micro structure, and demonstrated sufficient mechanical stability at pressures exceeding 0.4MPa. It is possible to realize the nano/microfluidic devices with high aspect ratios, high depth, and low surface roughness, such as nano-dot arrays, well structures, nano/micro channels, and other small and/or precise structures.
AbstractList We established a rapid fabrication technique utilizing two-step soft lithography to realize rigid nano/microfluidic devices which have high mechanical and thermal stability, good chemical resistance and replication accuracy. The proposed technique enables the production of rigid nano/micro structures including inlet and outlet ports by utilizing a mold master made from a soft material, conveniently and inexpensively. A device made from a thermosetting epoxy resin instead of a hard material showed a high replication accuracy, even with a high-aspect-ratio micro structure, and demonstrated sufficient mechanical stability at pressures exceeding 0.4MPa. It is possible to realize the nano/microfluidic devices with high aspect ratios, high depth, and low surface roughness, such as nano-dot arrays, well structures, nano/micro channels, and other small and/or precise structures.
Author Yamamoto, Takatoki
Sugii, Yasuhiko
Mogi, Katsuo
Fujii, Teruo
Author_xml – sequence: 1
  givenname: Katsuo
  surname: Mogi
  fullname: Mogi, Katsuo
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  organization: Mechanical and Control Engineering, Tokyo Institute of Technology, Japan
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  givenname: Yasuhiko
  surname: Sugii
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  organization: Mechanical and Control Engineering, Tokyo Institute of Technology, Japan
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  givenname: Teruo
  surname: Fujii
  fullname: Fujii, Teruo
  organization: Institute of Industrial Science, The University of Tokyo, Japan
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Micro fabrication
Poly-dimethylsiroxane
Microfluidic device
PDMS
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  ident: 10.1016/j.snb.2014.05.047_bib0025
  publication-title: Curr. Opin. Struct. Biol.
  doi: 10.1016/j.sbi.2003.09.010
  contributor:
    fullname: Hansen
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Snippet We established a rapid fabrication technique utilizing two-step soft lithography to realize rigid nano/microfluidic devices which have high mechanical and...
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elsevier
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StartPage 407
SubjectTerms Micro fabrication
Microfluidic device
Nano fabrication
PDMS
Poly-dimethylsiroxane
Title Rapid fabrication technique of nano/microfluidic device with high mechanical stability utilizing two-step soft lithography
URI https://dx.doi.org/10.1016/j.snb.2014.05.047
Volume 201
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