Controlling of material analysers of the GD-OES type with help of pump-down curves
Today, material analysis in industry and research centres is very often performed by the glow-discharge optical emission spectrometry (GD-OES), which allows an extraordinarily quick material analysis (average time of analysis: 2–5 min) and a determination mainly by the pumping time of the glow disch...
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Published in: | Vacuum Vol. 84; no. 2; pp. 299 - 303 |
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18-09-2009
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Abstract | Today, material analysis in industry and research centres is very often performed by the glow-discharge optical emission spectrometry (GD-OES), which allows an extraordinarily quick material analysis (average time of analysis: 2–5
min) and a determination mainly by the pumping time of the glow discharge source. The reliability of the analysis is, especially in the case of thin films (film thickness <100
nm), determined by the purity of the discharge gas and of the surface of the source and sample.
We could reduce the ultimate pressure and increase the purity of the gas at the place of analysis by improving the dimensions and construction of the pumping set, and the conduction of the pumping and venting process of a given commercial spectrometer device.
Moreover, an automatic and computer-aided evaluation of the pressure vs. time run in the source chamber can inform the user about possible leaks or contamination of inner surfaces. For this purpose, it is possible to use the control computer of commercial equipment and the data acquisition system of the GD-OES instrument. Thus, one can receive important hints from the
p–
t plot regarding the equipment and can start leak detection, cleaning of the source chamber or replacing of components in time. |
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AbstractList | Today, material analysis in industry and research centres is very often performed by the glow-discharge optical emission spectrometry (GD-OES), which allows an extraordinarily quick material analysis (average time of analysis: 2-5 min) and a determination mainly by the pumping time of the glow discharge source. The reliability of the analysis is, especially in the case of thin films (film thickness 100 nm), determined by the purity of the discharge gas and of the surface of the source and sample. We could reduce the ultimate pressure and increase the purity of the gas at the place of analysis by improving the dimensions and construction of the pumping set, and the conduction of the pumping and venting process of a given commercial spectrometer device. Moreover, an automatic and computer-aided evaluation of the pressure vs. time run in the source chamber can inform the user about possible leaks or contamination of inner surfaces. For this purpose, it is possible to use the control computer of commercial equipment and the data acquisition system of the GD-OES instrument. Thus, one can receive important hints from the p-t plot regarding the equipment and can start leak detection, cleaning of the source chamber or replacing of components in time. Today, material analysis in industry and research centres is very often performed by the glow-discharge optical emission spectrometry (GD-OES), which allows an extraordinarily quick material analysis (average time of analysis: 2–5 min) and a determination mainly by the pumping time of the glow discharge source. The reliability of the analysis is, especially in the case of thin films (film thickness <100 nm), determined by the purity of the discharge gas and of the surface of the source and sample. We could reduce the ultimate pressure and increase the purity of the gas at the place of analysis by improving the dimensions and construction of the pumping set, and the conduction of the pumping and venting process of a given commercial spectrometer device. Moreover, an automatic and computer-aided evaluation of the pressure vs. time run in the source chamber can inform the user about possible leaks or contamination of inner surfaces. For this purpose, it is possible to use the control computer of commercial equipment and the data acquisition system of the GD-OES instrument. Thus, one can receive important hints from the p– t plot regarding the equipment and can start leak detection, cleaning of the source chamber or replacing of components in time. |
Author | Hoffmann, Volker Klemm, Denis Edelmann, Christian |
Author_xml | – sequence: 1 givenname: Denis surname: Klemm fullname: Klemm, Denis email: d.klemm@ifw-dresden.de organization: IFW Dresden, Institute for Complex Materials, P.O. Box 270116, D - 01171 Dresden, Germany – sequence: 2 givenname: Volker surname: Hoffmann fullname: Hoffmann, Volker organization: IFW Dresden, Institute for Complex Materials, P.O. Box 270116, D - 01171 Dresden, Germany – sequence: 3 givenname: Christian surname: Edelmann fullname: Edelmann, Christian organization: Steinbeis Transfer Centre for Vacuum Science and Technology, Weisbachstrasse 2, D - 09599 Freiberg, Germany |
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CitedBy_id | crossref_primary_10_1016_j_tsf_2011_07_058 crossref_primary_10_1016_j_nucengdes_2023_112699 crossref_primary_10_1016_j_aca_2010_08_031 crossref_primary_10_1016_j_vacuum_2021_110358 crossref_primary_10_3740_MRSK_2011_21_9_509 crossref_primary_10_1039_c005533f crossref_primary_10_1108_00368791111101803 |
Cites_doi | 10.1007/s00216-007-1291-2 10.1039/b002367l 10.1016/S0042-207X(98)00375-3 10.1039/b007543o 10.1002/sia.1233 |
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SubjectTerms | Chambers Desorption Devices Emission analysis Evaluation Film thickness GD-OES GDOS GDS Glow discharges Pump curves Pumping Purity Spectrometers |
Title | Controlling of material analysers of the GD-OES type with help of pump-down curves |
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