Vanadium transition metal oxide films obtained by annealing under room atmosphere of metal layers sequentially deposited

Metallic thin films M/V/M/V... /V/M (M=Fe, Ni) sequentially deposited under vacuum were annealed for 1 2 h in room atmosphere. The samples were characterised by X-rays diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and optical absorption (OA) and near-i...

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Bibliographic Details
Published in:Journal of crystal growth Vol. 208; no. 1; pp. 471 - 481
Main Authors: Baba Ali, E, Bernède, J.C, Le Ray, P
Format: Journal Article
Language:English
Published: Amsterdam Elsevier B.V 2000
Elsevier
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Summary:Metallic thin films M/V/M/V... /V/M (M=Fe, Ni) sequentially deposited under vacuum were annealed for 1 2 h in room atmosphere. The samples were characterised by X-rays diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and optical absorption (OA) and near-infrared absorption. The annealing temperature and the substrate were taken as parameters. In addition some pre-annealing treatment was used. The results showed that monoclinic Ni 2V 2O 7 and triclinic FeVO 4, homogeneous thin films can be synthesised by this simple technique. Best results were obtained when the glass substrate used was coated with SnO 2 thin films. The results were improved when, before air-annealing, a first annealing under vacuum was proceeded in order to homogenise the metal distribution in the sample.
ISSN:0022-0248
1873-5002
DOI:10.1016/S0022-0248(99)00404-2