Low-loss optical waveguide on standard SOI/SIMOX substrate

Low-loss optical waveguide on standard SOI/SIMOX substrate

Propagation loss measurements are reported for silicon waveguides formed by the thin silicon film of standard SIMOX substrate. Values very close to the theoretical limit associated with leakage towards the substrate are obtained when a high quality interface between the silicon film and the passivat...

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Bibliographic Details
Published in:Optics communications Vol. 146; no. 1; pp. 31 - 33
Main Authors: Layadi, A, Vonsovici, A, Orobtchouk, R, Pascal, D, Koster, A
Format: Journal Article
Language:English
Published: Amsterdam Elsevier B.V 15-01-1998
Elsevier Science
Subjects:
Applied sciences
Circuit properties
Electric, optical and optoelectronic circuits
Electronics
Exact sciences and technology
Integrated optics. Optical fibers and wave guides
Optical and optoelectronic circuits
Propagation loss
SIMOX
Surface passivation
Waveguide
Waveguides, couplers, and arrays
SIMOX
Propagation loss
Waveguide
Surface passivation
SIMOX technology
Loss
Optical waveguide
Silicon
Experimental study
Surface treatment
Passivation
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Description
Summary:Propagation loss measurements are reported for silicon waveguides formed by the thin silicon film of standard SIMOX substrate. Values very close to the theoretical limit associated with leakage towards the substrate are obtained when a high quality interface between the silicon film and the passivation layer is achieved.
ISSN:0030-4018
1873-0310
DOI:10.1016/S0030-4018(97)00600-7