Manufacture of amorphous carbon layers by r.f. dense plasma CVD

• Published in: Diamond and related materials Vol. 4; no. 4; pp. 302 - 303
• Main Authors: Mitura, Stanislaw, Mitura, Ewa, Mitura, Anna
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Amsterdam Elsevier B.V 15-04-1995; Elsevier
• Subjects: Amorphous carbon; Applications; Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Gas phase reactors; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Physics; R.f. plasma CVD; R.f. plasma CVD; Amorphous carbon; Applications; Gas phase reactors; CVD; Thin films; Dense plasma; Nonmetals; Amorphous state; PECVD; Experimental study; Radiofrequency; Carbon; Plasma deposition
• ISSN: 0925-9635; 1879-0062
• DOI: 10.1016/0925-9635(94)05203-4

The results of experimental studies on the manufacture of amorphous carbon layers by a new method of r.f. dense plasma CVD are presented. The idea of this method is to excite a plasma in methane or other hydrocarbons in an r.f. electric field at a relatively high gas pressure of about 50–400 Pa. The Vickers hardness of the amorphous diamond layers obtained was about 9000 VHN. Amorphous diamond coatings produced by the r.f. dense CH
4 plasma method on AISI 316L steel used in surgery were investigated to determine their suitability as biomaterials.