Interface states in polyfluorene-based metal–insulator–semiconductor devices
Hybrid metal–insulator–semiconductor structures based on ethyl-hexyl substituted polyfluorene (PF2/6) as the active polymer semiconductor were fabricated on a highly doped p-Si substrate with Al 2O 3 as the insulating oxide layer. We present detailed frequency-dependent capacitance–voltage ( C– V) a...
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Published in: | Organic electronics Vol. 8; no. 5; pp. 591 - 600 |
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Main Authors: | , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
Amsterdam
Elsevier B.V
01-10-2007
Elsevier |
Subjects: | |
Online Access: | Get full text |
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Summary: | Hybrid metal–insulator–semiconductor structures based on ethyl-hexyl substituted polyfluorene (PF2/6) as the active polymer semiconductor were fabricated on a highly doped p-Si substrate with Al
2O
3 as the insulating oxide layer. We present detailed frequency-dependent capacitance–voltage (
C–
V) and conductance–voltage characteristics of the semiconductor/insulator interface. PF2/6 undergoes a transition to an ordered crystalline phase upon thermal cycling from its nematic-liquid crystalline phase, confirmed by our atomic force microscope images. Thermal cycling of the PF2/6 films significantly improves the quality of the (PF2/6)/Al
2O
3 interface, which is identified as a reduced hysteresis in the
C–
V curve and a decreased interface state density (
D
it) from ∼3.9
×
10
12
eV
−1
cm
−2 to ∼3.3
×
10
11
eV
−1
cm
−2 at the flat-band voltage. Interface states give rise to energy levels that are confined to the polymer/insulator interface. A conductance loss peak, observed due to the capture and emission of carriers by the interface states, fits very well with a single time constant model from which the
D
it values are inferred. |
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ISSN: | 1566-1199 1878-5530 |
DOI: | 10.1016/j.orgel.2007.04.007 |