Fabrication of TaOxNy thin films by reactive ion beam-assisted ac double magnetron sputtering for optical applications

• Published in: Thin solid films Vol. 615; pp. 351 - 357
• Main Authors: Bah, Souleymane T., Ba, Cheikhou O.F., D'Auteuil, Marc, Ashrit, P.V., Sorelli, Luca, Vallée, Réal
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 30-09-2016
• Subjects: Adhesion; Bragg mirrors; Chambers; Deposition; Economics; Magnetron sputtering; Nitrogen; Optical applications; Optical coatings; Oxynitrides; Reactive ion beam-assisted ac double magnetron sputtering; Refractive index; Tantalum oxynitrides; Thin films; Bragg mirrors; Tantalum oxynitrides; Reactive ion beam-assisted ac double magnetron sputtering; Optical coatings; Refractive index; Optical applications
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2016.07.055

Tantalum oxynitride (TaOxNy) thin films have been deposited by reactive ion beam-assisted ac double magnetron sputtering. Thin films deposited by this method are known to have high mechanical durability and adhesion. A controlled variation of the refractive index of these optical coatings has been achieved through a systematic control of the oxygen and nitrogen gases present in the chamber during the film deposition. This method offers a rapid and economical way of fabricating interference and gradient index coatings used in many optical applications. To show the potential of this deposition method, a Bragg mirror stack was made with twenty alternating layers of oxygen-rich (high x) and nitrogen-rich (high y) TaOxNy thin films.
•Tantalum oxynitride (TaOxNy) thin films are investigated for optical applications.•TaOxNy thin films are deposited by ac dual magnetron sputtering assisted by ion beam.•A refractive index variation are achieved through a reactive gases control.•A Bragg mirror stack is made with layers of oxygen rich and nitrogen rich thin films.