Photooxidation of Nanopatterned Poly(chloromethylstyrene): Direct Formation of Crosslinked Aldehyde-Functionalized Films for Chemical Functionalization and Bioconjugation

UV irradiation of chloromethyl styrene simultaneously crosslinks the polymer and generates aldehyde groups that can be employed for polymer surface functionalization through aldehyde‐imine/hydrazone chemistry. Using this method, we successfully have functionalized nanoimprinted polymer patterns with...

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Bibliographic Details
Published in:Macromolecular rapid communications. Vol. 31; no. 9-10; pp. 910 - 914
Main Authors: Yu, Xi, Subramani, Chandramouleeswaran, Yang, Xiaochao, Kim, Chae Kyu, Rotello, Vincent M.
Format: Journal Article
Language:English
Published: Weinheim WILEY-VCH Verlag 12-05-2010
WILEY‐VCH Verlag
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Summary:UV irradiation of chloromethyl styrene simultaneously crosslinks the polymer and generates aldehyde groups that can be employed for polymer surface functionalization through aldehyde‐imine/hydrazone chemistry. Using this method, we successfully have functionalized nanoimprinted polymer patterns with dyes, nanoparticles, and enzymes. These surfaces were characterized by infrared (ATR‐IR) spectroscopy, X‐ray photoelectron spectroscopy (XPS), fluorescence microscopy, and enzymatic activity assays. Aldehyde groups generated upon UV irradiation of chloromethyl styrene are utilized as surface active groups for polymer surface functionalization through aldehyde‐amine chemistry. Using this method, we successfully activate the inert nanoimprint polymer resist pattern, allowing facile immobilization of dyes, nanoparticles, and enzymes onto the pattern. The processes were characterized by attenuated total reflection infrared (ATR‐IR), X‐ray photoelectron spectroscopy (XPS), and fluorescence microscopy.
Bibliography:ArticleID:MARC200900925
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ISSN:1022-1336
1521-3927
DOI:10.1002/marc.200900925