The interaction between titanium dioxide nanoparticles and light can have dualistic effects on the physiological responses of plants

The model plant Arabidopsis thaliana was exposed to combined stress factors, i.e., titanium dioxide nanoparticles (TiNPs) and high light. The concentrations of TiNPs used for irrigation were 250, 500, and 1000 μg/mL. This study shows that TiNPs alter the morphology and nanomechanical properties of c...

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Bibliographic Details
Published in:Environmental science and pollution research international Vol. 31; no. 9; pp. 13706 - 13721
Main Authors: Orzechowska, Aleksandra, Szymańska, Renata, Sarna, Michał, Żądło, Andrzej, Trtílek, Martin, Kruk, Jerzy
Format: Journal Article
Language:English
Published: Berlin/Heidelberg Springer Berlin Heidelberg 01-02-2024
Springer Nature B.V
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Summary:The model plant Arabidopsis thaliana was exposed to combined stress factors, i.e., titanium dioxide nanoparticles (TiNPs) and high light. The concentrations of TiNPs used for irrigation were 250, 500, and 1000 μg/mL. This study shows that TiNPs alter the morphology and nanomechanical properties of chloroplasts in A. thaliana , which leads to a decrease in membrane elasticity. We found that TiNPs contributed to a delay in the thermal response of A. thaliana under dynamic light conditions, as revealed by non-invasive thermal imaging. The thermal time constants of TiNP-treated plants under excessive light are determined, showing a shortening in comparison to control plants. The results indicate that TiNPs may contribute to an alleviation of temperature stress experienced by plants under exposure to high light. In this research, we observed a decline in photosystem II photochemical efficiency accompanied by an increase in energy dissipation upon exposure to TiNPs. Interestingly, concentrations exceeding 250 µg/mL TiNPs appeared to mitigate the effects of high light, as shown by reduced differences in the values of specific OJIP parameters ( F V / F M , ABS / RC , DI 0 / RC , and Pi_Abs ) before and after light exposure.
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ISSN:1614-7499
0944-1344
1614-7499
DOI:10.1007/s11356-024-31970-6