The Investigation of Ferroelectric Domain Behavior Affected by Thin Metallic Electrode

The Investigation of Ferroelectric Domain Behavior Affected by Thin Metallic Electrode

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Published in:Japanese Journal of Applied Physics Vol. 45; no. 3S; p. 1981
Main Authors: Kim, Jong-Hun, Baek, J., Khim, Z. G., Shin, Sangmin, Koo, June-Mo, Kim, Suk-Pil, Park, Youngsoo
Format: Journal Article
Language:English
Published: 01-03-2006
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Author Khim, Z. G.
Kim, Suk-Pil
Baek, J.
Kim, Jong-Hun
Koo, June-Mo
Shin, Sangmin
Park, Youngsoo
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  givenname: Youngsoo
  surname: Park
  fullname: Park, Youngsoo
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Cites_doi 10.1063/1.360122
10.1116/1.589143
10.1103/PhysRevB.63.132103
10.1142/2150
10.1063/1.1952567
10.1063/1.1781354
10.1063/1.350286
10.1063/1.1899770
10.1063/1.357589
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References ([6]) 1996; 14
([3]) 2004; 85
([5]) 1995; 78
([9]) 1993
([4]) 1994; 76
([7]) 2001; 63
([8]) 1991; 70
([1]) 2005; 86
([2]) 2005; 86
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Title The Investigation of Ferroelectric Domain Behavior Affected by Thin Metallic Electrode
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