An experimental 4-Mbit CMOS DRAM

A 4-Mb dynamic RAM has been designed and fabricated using 1.0-/spl mu/m twin-tub CMOS technology. The memory array consists of trenched n-channel depletion-type capacitor cells in a p-well. Very high /spl alpha/-particle immunity was achieved with this structure. One cell measures 3.0/spl times/5.8...

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Bibliographic Details
Published in:IEEE journal of solid-state circuits Vol. 21; no. 5; pp. 605 - 611
Main Authors: Furuyama, T., Ohsawa, T., Watanabe, Y., Ishiuchi, H., Watanabe, T., Tanaka, T., Natori, K., Ozawa, O.
Format: Journal Article
Language:English
Published: New York, NY IEEE 01-10-1986
Institute of Electrical and Electronics Engineers
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Summary:A 4-Mb dynamic RAM has been designed and fabricated using 1.0-/spl mu/m twin-tub CMOS technology. The memory array consists of trenched n-channel depletion-type capacitor cells in a p-well. Very high /spl alpha/-particle immunity was achieved with this structure. One cell measures 3.0/spl times/5.8 /spl mu/m/SUP 2/ yielding a chip size of 7.84/spl times/17.48 mm/SUP 2/. An on-chip voltage converter circuit was implemented as a mask option to investigate a possible solution to the MOSFET reliability problem caused by hot carriers. An 8-bit parallel test mode was introduced to reduce the RAM test time. Metal mask options provide static-column-mode and fast-age-mode operation. The chip is usable as /spl times/1 or /spl times/4 organizations with a bonding option. Using an external 5-V power supply, the row-address-strobe access time is 80 ns at room temperature. The typical active current is 60 mA at a 220-ns cycle time with a standby current of 0.5 mA.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
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content type line 23
ISSN:0018-9200
1558-173X
DOI:10.1109/JSSC.1986.1052584