Long interior carrier lifetime in selective-area InAs nanowires on silicon

• Published in: Optical materials express Vol. 10; no. 10; p. 2470
• Main Authors: Zhang, Kailing, Li, Xinxin, Walhof, Alexander C., Liu, Yuzi, Toor, Fatima, Prineas, John P.
• Format: Journal Article
• Language: English
• Published: Washington Optical Society of America 01-10-2020
• Subjects: Carrier lifetime; Carrier recombination; Crystal defects; Diameters; Epitaxial growth; Indium arsenides; Lifetime; MATERIALS SCIENCE; Minority carriers; Nanowires; Silicon substrates
• ISSN: 2159-3930; 2159-3930
• DOI: 10.1364/OME.403531

Catalyst-free, position-controlled indium arsenide (InAs) nanowires (NWs) of variable diameters were grown on Si (111) by selective-area epitaxy (SAE). Ultrafast pump-probe spectroscopy was conducted, from which carrier recombination mechanisms on the NW surface and interior were resolved and characterized. NWs grown using SAE demonstrated high optical quality, showing minority carrier lifetimes more than two-fold longer than that of the randomly-positioned (RP) NWs. The extracted SAE-InAs NW interior recombination lifetime was found to be as long as 7.2 ns , 13X longer than previous measurements on RP-NWs; and the surface recombination velocity 4154 cm · s - 1 . Transmission electron microscopy revealed a high density of stacking defects within the NWs, suggesting that interior recombination lifetime can be further increased by improving NW interior crystalline quality.