Nanostructuring at Oblique Angle Deposition of Aluminum

Formation of regular arrays of nanorods with high aspect ratio (length to transverse size) has been found in the process of Al thin film growth at oblique angle deposition on silicon substrate by the method of electron beam evaporation. It was found that the optimal conditions for nanostructuring ar...

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Bibliographic Details
Published in:	Technical physics letters Vol. 47; no. 8; pp. 617 - 619
Main Authors:	Trushin, O. S., Popov, A. A., Pestova, A. N., Mazaletsky, L. A., Akulov, A. A.
Format:	Journal Article
Language:	English
Published:	Moscow Pleiades Publishing 01-08-2021 Springer Nature B.V
Subjects:	Aluminum Classical and Continuum Physics Deposition Electron beams Film growth High aspect ratio Inclination angle Nanorods Physics Physics and Astronomy Silicon substrates Thin films nanostructuring shadowing effect aluminum film electron beam evaporation oblique deposition
Online Access:	Get full text
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Summary:	Formation of regular arrays of nanorods with high aspect ratio (length to transverse size) has been found in the process of Al thin film growth at oblique angle deposition on silicon substrate by the method of electron beam evaporation. It was found that the optimal conditions for nanostructuring are realized at the inclination angle larger than 80 degrees.
ISSN:	1063-7850 1090-6533
DOI:	10.1134/S1063785021060250