Eliminating Whisker Growth by Indium Addition in Electroplated Sn on Copper Substrate
Whisker growth from Sn coatings is a reliability concern in electronic packages, until recently mitigated by Pb addition. Recently, it was demonstrated that doping with In dramatically reduces whisker growth in 1 μ m thick Sn. Here, we present the results of In-doping on whisker growth from 3 μ m...
Saved in:
Published in: | Journal of electronic materials Vol. 46; no. 7; pp. 4062 - 4075 |
---|---|
Main Authors: | , , , |
Format: | Journal Article |
Language: | English |
Published: |
New York
Springer US
01-07-2017
Springer Nature B.V |
Subjects: | |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Abstract | Whisker growth from Sn coatings is a reliability concern in electronic packages, until recently mitigated by Pb addition. Recently, it was demonstrated that doping with In dramatically reduces whisker growth in 1
μ
m thick Sn. Here, we present the results of In-doping on whisker growth from 3
μ
m and 6
μ
m thick Sn-films and explore the reasons behind this mitigation, and compare the results with a baseline sample of pure Sn and a control sample of tri-layer Sn-In-Sn, all subjected to identical thermal treatments. It is shown that In addition completely stops whisker growth from electroplated Sn. The impact of In addition on the film microstructure and the role of the surface oxide coating are investigated. Previous work had shown that while In addition reduces grain boundary diffusivity, it does not fully account for the observed dramatic reduction of whisker growth. In this work, it is shown by Auger electron spectroscopy and x-ray photoelectron spectroscopy that In is incorporated in the surface-oxide. Since whisker-growth is contingent on the presence of a tenacious surface-oxide, this suggests that the alteration of the oxide properties may be responsible for the observed reduction in whisker growth. Finite element modeling is utilized to demonstrate that a reduction of the elastic modulus of the surface oxide would reduce the driving force of Sn whisker growth, thus proffering a rationale for the effect of In incorporation. |
---|---|
AbstractList | Whisker growth from Sn coatings is a reliability concern in electronic packages, until recently mitigated by Pb addition. Recently, it was demonstrated that doping with In dramatically reduces whisker growth in 1 [mu]m thick Sn. Here, we present the results of In-doping on whisker growth from 3 [mu]m and 6 [mu]m thick Sn-films and explore the reasons behind this mitigation, and compare the results with a baseline sample of pure Sn and a control sample of tri-layer Sn-In-Sn, all subjected to identical thermal treatments. It is shown that In addition completely stops whisker growth from electroplated Sn. The impact of In addition on the film microstructure and the role of the surface oxide coating are investigated. Previous work had shown that while In addition reduces grain boundary diffusivity, it does not fully account for the observed dramatic reduction of whisker growth. In this work, it is shown by Auger electron spectroscopy and x-ray photoelectron spectroscopy that In is incorporated in the surface-oxide. Since whisker-growth is contingent on the presence of a tenacious surface-oxide, this suggests that the alteration of the oxide properties may be responsible for the observed reduction in whisker growth. Finite element modeling is utilized to demonstrate that a reduction of the elastic modulus of the surface oxide would reduce the driving force of Sn whisker growth, thus proffering a rationale for the effect of In incorporation. Whisker growth from Sn coatings is a reliability concern in electronic packages, until recently mitigated by Pb addition. Recently, it was demonstrated that doping with In dramatically reduces whisker growth in 1 μ m thick Sn. Here, we present the results of In-doping on whisker growth from 3 μ m and 6 μ m thick Sn-films and explore the reasons behind this mitigation, and compare the results with a baseline sample of pure Sn and a control sample of tri-layer Sn-In-Sn, all subjected to identical thermal treatments. It is shown that In addition completely stops whisker growth from electroplated Sn. The impact of In addition on the film microstructure and the role of the surface oxide coating are investigated. Previous work had shown that while In addition reduces grain boundary diffusivity, it does not fully account for the observed dramatic reduction of whisker growth. In this work, it is shown by Auger electron spectroscopy and x-ray photoelectron spectroscopy that In is incorporated in the surface-oxide. Since whisker-growth is contingent on the presence of a tenacious surface-oxide, this suggests that the alteration of the oxide properties may be responsible for the observed reduction in whisker growth. Finite element modeling is utilized to demonstrate that a reduction of the elastic modulus of the surface oxide would reduce the driving force of Sn whisker growth, thus proffering a rationale for the effect of In incorporation. |
Author | Bhassyvasantha, S. Das Mahapatra, S. Majumdar, B. S. Dutta, I. |
Author_xml | – sequence: 1 givenname: S. surname: Das Mahapatra fullname: Das Mahapatra, S. organization: School of Mechanical and Materials Engineering, Washington State University – sequence: 2 givenname: B. S. surname: Majumdar fullname: Majumdar, B. S. organization: Materials and Metallurgical Engineering Department, New Mexico Tech – sequence: 3 givenname: I. surname: Dutta fullname: Dutta, I. email: idutta@wsu.edu organization: School of Mechanical and Materials Engineering, Washington State University – sequence: 4 givenname: S. surname: Bhassyvasantha fullname: Bhassyvasantha, S. organization: Materials and Metallurgical Engineering Department, New Mexico Tech |
BookMark | eNp1kEFLwzAYhoNMcJv-AG8Bz9V8aZO2xzHmHAw8zKG30DbpltklNWmR_nsz6sGLpw9e3uf94JmhibFGIXQP5BEISZ88AOdJRIBHDNI0Gq7QFFgSR5DxjwmakphDxGjMbtDM-xMhwCCDKdqvGn3Wpui0OeD3o_afyuG1s9_dEZcD3hip-zNeSKk7bQ3WBq8aVXXOtk3RKYl3Bod4ads2cLu-9J0L-S26rovGq7vfO0f759Xb8iXavq43y8U2qmLgXVTVeUGBZzzhMssoIyQpkzyNk1QmULCUp5WkVJaqliWUJeVcSkYqknAFVZ4V8Rw9jLuts1-98p042d6Z8FJATnjMCc1IaMHYqpz13qlatE6fCzcIIOJiT4z2RLAnLvbEEBg6Mj50zUG5P8v_Qj9Ml3RT |
CitedBy_id | crossref_primary_10_1007_s11837_019_03933_7 crossref_primary_10_1007_s11664_018_6522_0 crossref_primary_10_1007_s11664_020_08602_z crossref_primary_10_1016_j_jallcom_2020_157101 crossref_primary_10_1007_s11664_020_08440_z crossref_primary_10_1007_s10853_021_06410_2 crossref_primary_10_1016_j_surfcoat_2018_01_061 crossref_primary_10_1016_j_msea_2017_09_006 |
Cites_doi | 10.1007/s11664-011-1737-3 10.1063/1.3597653 10.1007/s11664-011-1829-0 10.5006/0010-9312-7.10.327 10.1007/s11664-009-0915-z 10.1016/0039-6028(83)90438-7 10.1016/S0927-796X(02)00007-4 10.1557/jmr.2006.0368 10.1016/j.actamat.2005.07.016 10.3866/PKU.WHXB20090214 10.1016/j.msea.2016.04.049 10.1007/s11664-005-0274-3 10.1007/s11664-007-0369-0 10.1007/978-1-4757-1702-0 10.1103/PhysRevB.49.2030 10.1007/s10853-015-9680-y 10.1016/j.msea.2005.06.074 10.1063/1.2912528 10.1007/s11664-999-0190-z 10.1007/s11664-015-4204-8 10.1007/s11661-010-0431-z 10.1063/1.2953973 10.1007/s11664-012-2267-3 10.1007/s10854-006-9030-6 10.1007/s10853-010-4359-x |
ContentType | Journal Article |
Copyright | The Minerals, Metals & Materials Society 2016 Journal of Electronic Materials is a copyright of Springer, 2017. |
Copyright_xml | – notice: The Minerals, Metals & Materials Society 2016 – notice: Journal of Electronic Materials is a copyright of Springer, 2017. |
DBID | AAYXX CITATION 3V. 7XB 88I 8AF 8AO 8FE 8FG 8FK 8G5 ABJCF ABUWG AFKRA ARAPS AZQEC BENPR BGLVJ CCPQU D1I DWQXO GNUQQ GUQSH HCIFZ KB. L6V M2O M2P M7S MBDVC P5Z P62 PDBOC PQEST PQQKQ PQUKI PRINS PTHSS Q9U S0X |
DOI | 10.1007/s11664-016-5177-y |
DatabaseName | CrossRef ProQuest Central (Corporate) ProQuest Central (purchase pre-March 2016) Science Database (Alumni Edition) STEM Database ProQuest Pharma Collection ProQuest SciTech Collection ProQuest Technology Collection ProQuest Central (Alumni) (purchase pre-March 2016) Research Library (Alumni Edition) Materials Science & Engineering Collection ProQuest Central (Alumni) ProQuest Central Advanced Technologies & Aerospace Collection ProQuest Central Essentials ProQuest Central Technology Collection ProQuest One Community College ProQuest Materials Science Collection ProQuest Central ProQuest Central Student Research Library Prep SciTech Premium Collection (Proquest) (PQ_SDU_P3) Materials Science Database ProQuest Engineering Collection ProQuest_Research Library ProQuest Science Journals Engineering Database Research Library (Corporate) Advanced Technologies & Aerospace Database ProQuest Advanced Technologies & Aerospace Collection Materials Science Collection ProQuest One Academic Eastern Edition (DO NOT USE) ProQuest One Academic ProQuest One Academic UKI Edition ProQuest Central China Engineering Collection ProQuest Central Basic SIRS Editorial |
DatabaseTitle | CrossRef Research Library Prep ProQuest Central Student Technology Collection ProQuest Advanced Technologies & Aerospace Collection ProQuest Central Essentials SIRS Editorial Materials Science Collection ProQuest AP Science ProQuest Central (Alumni Edition) SciTech Premium Collection ProQuest One Community College Research Library (Alumni Edition) ProQuest Pharma Collection ProQuest Central China ProQuest Central ProQuest Engineering Collection ProQuest Central Korea Materials Science Database ProQuest Research Library Engineering Collection ProQuest Materials Science Collection Advanced Technologies & Aerospace Collection Engineering Database ProQuest Science Journals (Alumni Edition) ProQuest Central Basic ProQuest Science Journals ProQuest One Academic Eastern Edition ProQuest Technology Collection ProQuest SciTech Collection Advanced Technologies & Aerospace Database ProQuest One Academic UKI Edition Materials Science & Engineering Collection ProQuest One Academic ProQuest Central (Alumni) |
DatabaseTitleList | Research Library Prep |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Engineering |
EISSN | 1543-186X |
EndPage | 4075 |
ExternalDocumentID | 10_1007_s11664_016_5177_y |
GrantInformation_xml | – fundername: National Science Foundation(NSF) grantid: CMMI-1335199/1335491 |
GroupedDBID | -4Y -58 -5G -BR -EM -Y2 -~C -~X .4S .86 .DC .VR 06C 06D 0R~ 0VY 199 1N0 1SB 2.D 203 28- 29K 2J2 2JN 2JY 2KG 2KM 2LR 2VQ 2~H 30V 3V. 4.4 406 408 40D 40E 5GY 5VS 67Z 6NX 78A 88I 8AF 8AO 8FE 8FG 8FW 8G5 8TC 8UJ 95- 95. 95~ 96X AABHQ AABYN AAFGU AAGCJ AAHNG AAIAL AAIKT AAJKR AANZL AARHV AARTL AATNV AATVU AAUCO AAUYE AAWCG AAYFA AAYIU AAYQN AAYTO ABDZT ABECU ABEFU ABFGW ABFTD ABFTV ABHLI ABHQN ABJCF ABJNI ABJOX ABKAS ABKCH ABMNI ABMQK ABNWP ABQBU ABSXP ABTAH ABTEG ABTHY ABTKH ABTMW ABULA ABUWG ABWNU ABXPI ACBEA ACBMV ACBRV ACBXY ACBYP ACGFO ACGFS ACGOD ACHSB ACHXU ACIGE ACIHN ACIPQ ACIWK ACKNC ACMDZ ACMLO ACOKC ACOMO ACREN ACTTH ACVWB ACWMK ADHHG ADHIR ADINQ ADKNI ADKPE ADMDM ADOXG ADRFC ADTPH ADURQ ADYFF ADYOE ADZKW AEAQA AEBTG AEEQQ AEFTE AEGAL AEGNC AEJHL AEJRE AEKMD AENEX AEOHA AEPYU AESKC AESTI AETLH AEVLU AEVTX AEXYK AFEXP AFGCZ AFKRA AFLOW AFNRJ AFQWF AFWTZ AFYQB AFZKB AGAYW AGDGC AGGBP AGGDS AGJBK AGMZJ AGQMX AGWIL AGWZB AGYKE AHAVH AHBYD AHKAY AHSBF AHYZX AIAKS AIIXL AILAN AIMYW AITGF AJBLW AJDOV AJGSW AJRNO AJZVZ AKQUC ALMA_UNASSIGNED_HOLDINGS ALWAN AMKLP AMTXH AMXSW AMYLF AMYQR AOCGG ARAPS ARCSS ARMRJ ASPBG AVWKF AXYYD AYJHY AZFZN AZQEC B-. BA0 BBWZM BDATZ BENPR BGLVJ BGNMA BPHCQ C1A CAG CCPQU COF CS3 CSCUP CZ9 D-I D1I DDRTE DNIVK DPUIP DU5 DWQXO E3Z EBLON EBS EDO EIOEI EJD ESBYG FEDTE FERAY FFXSO FIGPU FINBP FNLPD FRRFC FSGXE FWDCC G-Y G-Z G8K GGCAI GGRSB GJIRD GNUQQ GNWQR GQ6 GQ7 GUQSH HCIFZ HF~ HG5 HG6 HMJXF HRMNR HVGLF HZ~ I-F IJ- IKXTQ ITM IWAJR IXC IXE IZQ I~X I~Z J-C J0Z JBSCW JZLTJ KB. KC. KDC KOV L6V LLZTM M2O M2P M2Q M4Y M7S MA- MK~ N2Q N9A NB0 NDZJH NF0 NPVJJ NQJWS NU0 O9- O93 O9G O9I O9J OAM P19 P2P P62 P9N PDBOC PF0 PK8 PQQKQ PROAC PT4 PT5 PTHSS Q2X QF4 QM1 QN7 QO4 QOK QOR QOS R4E R89 R9I RHV RNI RNS ROL RPX RSV RWL RXW RZK S0X S16 S1Z S26 S27 S28 S3B SAP SCG SCLPG SCM SDH SDM SHX SISQX SNE SNPRN SNX SOHCF SOJ SPISZ SQXTU SRMVM SSLCW STPWE SZN T13 T16 TAE TSG TSK TSV TUC TUS TWZ U2A UG4 UNUBA UOJIU UTJUX UZXMN VC2 VFIZW W48 W4F WK8 XFK YLTOR Z45 Z5O Z7R Z7S Z7V Z7W Z7X Z7Y Z7Z Z83 Z85 Z88 Z8M Z8N Z8P Z8Q Z8R Z8T Z8W Z8Z Z92 ZE2 ZMTXR ZY4 ~EX AACDK AAEOY AAJBT AASML AAYXX AAYZH ABAKF ABDPE ACAOD ACDTI ACZOJ AEFQL AEMSY AFBBN AGJZZ AGQEE AGRTI AIGIU CITATION H13 SJYHP 7XB 8FK MBDVC PQEST PQUKI PRINS Q9U |
ID | FETCH-LOGICAL-c316t-cf9a2168646d8825004b497347d41a5767cd22dbefdb1bb266dd50c046e1c98a3 |
IEDL.DBID | AEJHL |
ISSN | 0361-5235 |
IngestDate | Mon Nov 04 11:29:18 EST 2024 Thu Nov 21 22:08:32 EST 2024 Sat Dec 16 12:01:46 EST 2023 |
IsPeerReviewed | true |
IsScholarly | true |
Issue | 7 |
Keywords | tin indium mitigation Whisker dopant |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-LOGICAL-c316t-cf9a2168646d8825004b497347d41a5767cd22dbefdb1bb266dd50c046e1c98a3 |
PQID | 1906360280 |
PQPubID | 48394 |
PageCount | 14 |
ParticipantIDs | proquest_journals_1906360280 crossref_primary_10_1007_s11664_016_5177_y springer_journals_10_1007_s11664_016_5177_y |
PublicationCentury | 2000 |
PublicationDate | 2017-07-01 |
PublicationDateYYYYMMDD | 2017-07-01 |
PublicationDate_xml | – month: 07 year: 2017 text: 2017-07-01 day: 01 |
PublicationDecade | 2010 |
PublicationPlace | New York |
PublicationPlace_xml | – name: New York – name: Warrendale |
PublicationTitle | Journal of electronic materials |
PublicationTitleAbbrev | Journal of Elec Materi |
PublicationYear | 2017 |
Publisher | Springer US Springer Nature B.V |
Publisher_xml | – name: Springer US – name: Springer Nature B.V |
References | I. Fujimura, E.J.Vardaman, and T.G. Lenihan, ASME in InterPACK Conference, San Francisco, California (2009), pp. 1457–1462. MatWeb Material Property Data (2016), http://www.mat web.com/search/datasheet.aspx?matguid=64d7cf04332e42 8dbca9f755f4624a6c&ckck=1. Accessed 20 June 2016. H.E. Schoeller, Thermodynamics and kinetics of oxidation and temperature dependent mechanical characterization of pure indium solder, Thesis BSME. State University of New York at Binghamton, pp. 112–115 (2005) BanerjeeSDuttaIMajumdarBSMater. Sci. Eng. A201666619110.1016/j.msea.2016.04.049 Ye-PingDuJing-ChaoChenJingFengActa Phys. Chim. Sin.200925278 JadhavNWassermanJPeiFChasonEJ. Electron. Mater.20124158810.1007/s11664-011-1829-0 MeinshausenLBhassyvasanthaSMajumdarBSDuttaIJ. Electron. Mater.20164579110.1007/s11664-015-4204-8 MillerSMSahaymUNortonMGMaterMetall. Trans. A201041338610.1007/s11661-010-0431-z SandnesEWilliamsMEVaudinMDStraffordGRJ. Electron. Mater.20073749010.1007/s11664-007-0369-0 MoonKWJohnsonCEWilliamsMEKongsteinOStaffordGRHandwerkerCABoettingerWJJ. Electron. Mater.200534L3110.1007/s11664-005-0274-3 ComptonKGMendizzaAArnoldSMCorrosion1951732710.5006/0010-9312-7.10.327 WintersteinJPNortonMGJ. Mater. Res.200621297110.1557/jmr.2006.0368 JadhavNitinWilliamsMaureenPeiFeiStaffordGeryChasonEricJ. Electron. Mater.20134231210.1007/s11664-012-2267-3 T.A. Woodrow and E.A. Ledbury, in Proceedings of SMTA International Conference, Rosemont, IL (2006), p. 1 TuKNLiJCMMater. Sci. Eng., A200540913110.1016/j.msea.2005.06.074 ZengKTuKNMater. Sci. Eng., R2002385510.1016/S0927-796X(02)00007-4 Thermo-scientific XPS knowledge base (2016), http://xpssi mplified.com/elements/indium.php. Accessed 15 April 2016 TuKNPhys. Rev. B199449203010.1103/PhysRevB.49.2030 S.M. Arnold, in Proceedings of the IEEE Electrical Components Conference, (1959), p. 75 L. Meinshausen, S. Banerjee, I. Dutta, and B.S. Majumdar, in Proceedings of ASME InterPACK/ICNMM, San Francisco CA, (2015), pp. A21–A28 ChengJViancoPTZhangBLiJCMAppl. Phys. Lett.20119824191010.1063/1.3597653 A.E. Pedigo, C.A. Handwerker, and J.E. Blendell, in Proceedings of the 58th Electronic Components and Technology Conference, (2008), pp. 1498–1504 ArnoldSMPlating19665396 ChasonEJadhavNChanWLReinboldLKumarKSAppl. Phys. Lett.20089217190110.1063/1.2912528 BevoloAJVerhoevenJDNoackMSurf. Sci.198313449910.1016/0039-6028(83)90438-7 XirouchakiCMoschovisKChatzitheodoridisEKiriakidisGBoyeHMorgenPJ. Electron. Mater.1999282610.1007/s11664-999-0190-z ChenHLeeHYKuCSWuATJ. Mater. Sci.201651360010.1007/s10853-015-9680-y SobiechMTeufelJWelzelUMittemeijerEJHuegelWJ. Electron. Mater.201140230010.1007/s11664-011-1737-3 DimitrovskaAKovacevicRJ. Electron. Mater.200938272610.1007/s11664-009-0915-z H. Leidecker and J. S. Kadesch, in Proceedings of the 37th IMAPS Nordic Annual Conference, (2000), pp. 108–116 M. Osterman, Mitigation strategies for tin whiskers (2002), http://www.calce.umd.edu/lead-free/tin-whiskers/TINWHI SKERMITIGATION.pdf. Accessed 28 August 2002 SobiechMWelzelUMittemeijerEJHugelWSeekampAAppl. Phys. Lett.200893110.1063/1.2953973 BrandesEABrookGBSmithells Metals Reference Book19927OxfordButterworth-Heinemann Ltd13 J.A. Brusse, G.J. Ewell, and J.P. Siplon, in 22nd Capacitor and Resistor Technology Symposium, (2002), p. 67. H. Leidecker and J.A. Brusse, Tin whiskers: a history of documented electrical system failures–technical presentation to space shuttle program office (2006), http://nepp.nasa. gov/whisker. Accessed 25 April 2006 DuttaIBurkardMKuwanoSFujitaTChenMWJ. Mater. Sci.201045336710.1007/s10853-010-4359-x McGuireGEAuger Electron Spectroscopy Reference Manual19791New YorkSpringer Science Business Media9810310.1007/978-1-4757-1702-0 BoettingerWJJohnsonCEBenderskyLAMoonKWWilliamsMEStaffordGRActa Mater.200553503310.1016/j.actamat.2005.07.016 OsenbachJWDeLuccaJMPotteigerBDAminABaiocchiFAJ. Mater. Sci. Mater. Electron.20071828310.1007/s10854-006-9030-6 5177_CR31 N Jadhav (5177_CR37) 2012; 41 5177_CR34 M Sobiech (5177_CR13) 2011; 40 5177_CR15 I Dutta (5177_CR9) 2010; 45 5177_CR39 EA Brandes (5177_CR19) 1992 JW Osenbach (5177_CR6) 2007; 18 K Zeng (5177_CR11) 2002; 38 KN Tu (5177_CR35) 1994; 49 C Xirouchaki (5177_CR33) 1999; 28 S Banerjee (5177_CR36) 2016; 666 M Sobiech (5177_CR10) 2008; 93 WJ Boettinger (5177_CR12) 2005; 53 KG Compton (5177_CR3) 1951; 7 5177_CR2 5177_CR4 GE McGuire (5177_CR22) 1979 5177_CR30 E Sandnes (5177_CR17) 2007; 37 5177_CR20 SM Arnold (5177_CR5) 1966; 53 5177_CR1 SM Miller (5177_CR8) 2010; 41 5177_CR25 5177_CR26 L Meinshausen (5177_CR29) 2016; 45 KN Tu (5177_CR27) 2005; 409 J Cheng (5177_CR7) 2011; 98 5177_CR28 Du Ye-Ping (5177_CR21) 2009; 25 E Chason (5177_CR24) 2008; 92 A Dimitrovska (5177_CR16) 2009; 38 KW Moon (5177_CR23) 2005; 34 JP Winterstein (5177_CR14) 2006; 21 H Chen (5177_CR38) 2016; 51 Nitin Jadhav (5177_CR18) 2013; 42 AJ Bevolo (5177_CR32) 1983; 134 |
References_xml | – volume: 40 start-page: 2300 year: 2011 ident: 5177_CR13 publication-title: J. Electron. Mater. doi: 10.1007/s11664-011-1737-3 contributor: fullname: M Sobiech – ident: 5177_CR20 – volume: 98 start-page: 241910 year: 2011 ident: 5177_CR7 publication-title: Appl. Phys. Lett. doi: 10.1063/1.3597653 contributor: fullname: J Cheng – volume: 41 start-page: 588 year: 2012 ident: 5177_CR37 publication-title: J. Electron. Mater. doi: 10.1007/s11664-011-1829-0 contributor: fullname: N Jadhav – ident: 5177_CR39 – volume: 7 start-page: 327 year: 1951 ident: 5177_CR3 publication-title: Corrosion doi: 10.5006/0010-9312-7.10.327 contributor: fullname: KG Compton – ident: 5177_CR1 – volume: 38 start-page: 2726 year: 2009 ident: 5177_CR16 publication-title: J. Electron. Mater. doi: 10.1007/s11664-009-0915-z contributor: fullname: A Dimitrovska – volume: 134 start-page: 499 year: 1983 ident: 5177_CR32 publication-title: Surf. Sci. doi: 10.1016/0039-6028(83)90438-7 contributor: fullname: AJ Bevolo – ident: 5177_CR34 – volume: 38 start-page: 55 year: 2002 ident: 5177_CR11 publication-title: Mater. Sci. Eng., R doi: 10.1016/S0927-796X(02)00007-4 contributor: fullname: K Zeng – volume: 21 start-page: 2971 year: 2006 ident: 5177_CR14 publication-title: J. Mater. Res. doi: 10.1557/jmr.2006.0368 contributor: fullname: JP Winterstein – start-page: 13 volume-title: Smithells Metals Reference Book year: 1992 ident: 5177_CR19 contributor: fullname: EA Brandes – volume: 53 start-page: 5033 year: 2005 ident: 5177_CR12 publication-title: Acta Mater. doi: 10.1016/j.actamat.2005.07.016 contributor: fullname: WJ Boettinger – ident: 5177_CR30 – volume: 25 start-page: 278 year: 2009 ident: 5177_CR21 publication-title: Acta Phys. Chim. Sin. doi: 10.3866/PKU.WHXB20090214 contributor: fullname: Du Ye-Ping – volume: 666 start-page: 191 year: 2016 ident: 5177_CR36 publication-title: Mater. Sci. Eng. A doi: 10.1016/j.msea.2016.04.049 contributor: fullname: S Banerjee – volume: 34 start-page: L31 year: 2005 ident: 5177_CR23 publication-title: J. Electron. Mater. doi: 10.1007/s11664-005-0274-3 contributor: fullname: KW Moon – ident: 5177_CR25 – volume: 37 start-page: 490 year: 2007 ident: 5177_CR17 publication-title: J. Electron. Mater. doi: 10.1007/s11664-007-0369-0 contributor: fullname: E Sandnes – start-page: 98 volume-title: Auger Electron Spectroscopy Reference Manual year: 1979 ident: 5177_CR22 doi: 10.1007/978-1-4757-1702-0 contributor: fullname: GE McGuire – volume: 53 start-page: 96 year: 1966 ident: 5177_CR5 publication-title: Plating contributor: fullname: SM Arnold – ident: 5177_CR15 – volume: 49 start-page: 2030 year: 1994 ident: 5177_CR35 publication-title: Phys. Rev. B doi: 10.1103/PhysRevB.49.2030 contributor: fullname: KN Tu – ident: 5177_CR2 – volume: 51 start-page: 3600 year: 2016 ident: 5177_CR38 publication-title: J. Mater. Sci. doi: 10.1007/s10853-015-9680-y contributor: fullname: H Chen – ident: 5177_CR4 – volume: 409 start-page: 131 year: 2005 ident: 5177_CR27 publication-title: Mater. Sci. Eng., A doi: 10.1016/j.msea.2005.06.074 contributor: fullname: KN Tu – volume: 92 start-page: 171901 year: 2008 ident: 5177_CR24 publication-title: Appl. Phys. Lett. doi: 10.1063/1.2912528 contributor: fullname: E Chason – volume: 28 start-page: 26 year: 1999 ident: 5177_CR33 publication-title: J. Electron. Mater. doi: 10.1007/s11664-999-0190-z contributor: fullname: C Xirouchaki – volume: 45 start-page: 791 year: 2016 ident: 5177_CR29 publication-title: J. Electron. Mater. doi: 10.1007/s11664-015-4204-8 contributor: fullname: L Meinshausen – ident: 5177_CR31 – volume: 41 start-page: 3386 year: 2010 ident: 5177_CR8 publication-title: Metall. Trans. A doi: 10.1007/s11661-010-0431-z contributor: fullname: SM Miller – volume: 93 start-page: 1 year: 2008 ident: 5177_CR10 publication-title: Appl. Phys. Lett. doi: 10.1063/1.2953973 contributor: fullname: M Sobiech – volume: 42 start-page: 312 year: 2013 ident: 5177_CR18 publication-title: J. Electron. Mater. doi: 10.1007/s11664-012-2267-3 contributor: fullname: Nitin Jadhav – volume: 18 start-page: 283 year: 2007 ident: 5177_CR6 publication-title: J. Mater. Sci. Mater. Electron. doi: 10.1007/s10854-006-9030-6 contributor: fullname: JW Osenbach – volume: 45 start-page: 3367 year: 2010 ident: 5177_CR9 publication-title: J. Mater. Sci. doi: 10.1007/s10853-010-4359-x contributor: fullname: I Dutta – ident: 5177_CR26 – ident: 5177_CR28 |
SSID | ssj0015181 |
Score | 2.2799096 |
Snippet | Whisker growth from Sn coatings is a reliability concern in electronic packages, until recently mitigated by Pb addition. Recently, it was demonstrated that... |
SourceID | proquest crossref springer |
SourceType | Aggregation Database Publisher |
StartPage | 4062 |
SubjectTerms | Alloys Auger spectroscopy Characterization and Evaluation of Materials Chemistry and Materials Science Coating Coatings Copper Diffusivity Doping Electron spectroscopy Electronics Electronics and Microelectronics Finite element method Indium Instrumentation Materials Materials Science Mathematical analysis Mathematical models Microstructure Modulus of elasticity Optical and Electronic Materials Packages Photoelectron spectroscopy Reliability Solid State Physics Substrates Thick films |
Title | Eliminating Whisker Growth by Indium Addition in Electroplated Sn on Copper Substrate |
URI | https://link.springer.com/article/10.1007/s11664-016-5177-y https://www.proquest.com/docview/1906360280 |
Volume | 46 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://sdu.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV3NT8IwFG8ULnrw24ii6cGTpoZubdcdEYdgDDFBordl_Vgg4Fj4OPDf244N0OhBT0u2tVneXt9H36-_B8B17NM4kpghz6cUEYkxEswnSHCuuRbCd6U9jdzqep13_hBYmhxntXWRDO-KimRmqNdn3TBjFjDBEMWehxbboGxcDzW6Xa4HT63nVe2A4qw1qTHN2KZZtKhl_jTJV2-0DjG_VUUzZ9Pc_89nHoC9PLSE9aUuHIItnRyB3Q3CwWPQC0ZZFy-LdYZv_cF0qCfw0WTisz4UC9hO1GD-AetKZUAuOEhgsGyTk45MTKpgN4HmdmOcpmactTkZt-0J6DWD10YL5Y0VkHQxmyEZ-5GDGWeEKRNhU7NQBPE9l3iK4MhkIJ5UjqOEjpXAQhgfrhStSZNKayx9HrmnoJSME30GoLRbRySWkjuK-KQWEaqiyFgFRTQ3IyrgphBwmC75M8I1U7KVVWgxZlZW4aICqsUvCPOlNA1NxGI5zRxeq4DbQuYbj3-b7PxPb1-AHcc67AyIWwWl2WSuL8H2VM2vcv0y12a7c__yCSxyzCU |
link.rule.ids | 315,782,786,27933,27934,41073,42142,48344,48347,48357,49649,49652,49662,52153 |
linkProvider | Springer Nature |
linkToHtml | http://sdu.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV07T8MwED7RMgADb0ShgAcmkKU6sR17rEpf4rFQBFsUP6JWQKj6GPrvsdOGAoIB1iS2osv5HrnvvgM4TyVLE004jiRjmGpCsOKSYiWEFVYpGWrfjdy5j-6exFXT0-SERS9MjnYvSpK5pV42uxHOPWKCY0aiCM9KsEolp06VV-vdXrv1UTxgJJ9N6mwz8XkWK4qZP23y1R0tY8xvZdHc27S2_vWe27C5CC5Rfa4NO7Bis13Y-EQ5uAcPzZd8jpdHO6PH_mD8bEeo7XLxSR-pGepmZjB9RXVjcigXGmSoOR-UM3xxUalB9xlylxtvw6Fb561Ozm67Dw-tZq_RwYvRCliHhE-wTmUSEC445cbF2MwdFUVlFNLIUJK4HCTSJgiMsqlRRCnnxY1hNe2SaUu0FEl4AOXsLbOHgLT_eURTrUVgqKS1hDKTJM4uGGqFW1GBi0LC8XDOoBEvuZK9rGKPMvOyimcVqBbfIF4cpnHsYhbPahaIWgUuC5l_uv3bZkd_evoM1jq925v4pnt3fQzrgXffOSy3CuXJaGpPoDQ209OFsr0DDlHOgw |
linkToPdf | http://sdu.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwpV3JTsMwEB2xSAgO7Iiy-sAJZFGntuOcUAUpBaoKqSC4RfEStaKkUZdD_x47bWhBcEBck9iKJuNZMm_eAJwlAUtiRTj2A8YwVYRgyQOKpRBGGCmDinLdyPWW33wVN6GjybkqemFytHtRkpz0NDiWpnR4menkctb4Rjh36AmOGfF9PF6EZWoTGavoy9Xwvt74LCQwks8ptXaauJyLFYXNnzb56ppm8ea3EmnueWob_37nTVifBp2oOtGSLVgw6TaszVER7sBz2M3nezkUNHppdwZvpo9ubY4-bCM5Rnep7ozeUVXrHOKFOikKJwN0sq6NVjVqpchevu5lmV3nrFHOersLz7Xw6bqOpyMXsKoQPsQqCWKPcMEp1zb2ZvYISRr4FeprSmKbm_hKe56WJtGSSGm9u9asrGySbYgKRFzZg6W0l5p9QMr9VKKJUsLTNKDlmDIdx9ZeaGqEXVGC80LaUTZh1ohmHMpOVpFDnzlZReMSHBXfI5oeskFkYxnHduaJcgkuCvnP3f5ts4M_PX0KK483tahx13w4hFXPefUcrXsES8P-yBzD4kCPTqZ69wFCUddG |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Eliminating+Whisker+Growth+by+Indium+Addition+in+Electroplated+Sn+on+Copper+Substrate&rft.jtitle=Journal+of+electronic+materials&rft.au=Das+Mahapatra%2C+S.&rft.au=Majumdar%2C+B.+S.&rft.au=Dutta%2C+I.&rft.au=Bhassyvasantha%2C+S.&rft.date=2017-07-01&rft.pub=Springer+US&rft.issn=0361-5235&rft.eissn=1543-186X&rft.volume=46&rft.issue=7&rft.spage=4062&rft.epage=4075&rft_id=info:doi/10.1007%2Fs11664-016-5177-y&rft.externalDocID=10_1007_s11664_016_5177_y |
thumbnail_l | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0361-5235&client=summon |
thumbnail_m | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0361-5235&client=summon |
thumbnail_s | http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0361-5235&client=summon |